Fluoride

Fluoride

SCHEMBL7103699

F.F.F.N.N

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL2101308 1.00
Fluoride SCHEMBL10481826 1.00
Fluoride SCHEMBL135929 1.00
Fluoride SCHEMBL11685317 1.00
Fluoride SCHEMBL8895154 1.00
Fluoride SCHEMBL11355265 1.00
Fluoride SCHEMBL1004340 1.00
Fluoride SCHEMBL8895159 1.00
Fluoride SCHEMBL2514392 1.00
Fluoride SCHEMBL2000 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10347531-B2 Middle of the line (MOL) contact formation method and structure GLOBALFOUNDRIES INC. (KY) 2019-07-09 US claimed
CN-103950948-B The preparation method of high-purity boron trifluoride-11 FANG ZHIWEN (CN) 2015-11-04 CN claimed
CN-103950948-A Preparation method of high-purity boron trifluoride-11 FANG ZHIWEN 2014-07-30 CN claimed
CN-101408515-B Method for measuring zirconium in steel SHANGHAI ELECTRIC POWER GENERATION EQUIPMENT CO LTD 2010-10-06 CN claimed
CN-101408515-A Method for measuring zirconium in steel SHANGHAI ELECTRIC POWER GENERATION EQUIPMENT CO LTD (CN) 2009-04-15 CN claimed
EP-0827188-B1 Cleaning liquid for producing semiconductor device and process for producing semiconductor device using same MITSUBISHI GAS CHEMICAL CO (JP) 2003-09-17 EP claimed
EP-0988107-A4 METHOD FOR MICROENCAPSULATING WATER-SOLUBLE OR WATER-DISPERSIBLE OR WATER-SENSITIVE MATERIALS IN AN ORGANIC CONTINUOUS PHASE MICROTEK LAB INC (US) 2000-09-06 EP claimed
EP-0988107-A1 METHOD FOR MICROENCAPSULATING WATER-SOLUBLE OR WATER-DISPERSIBLE OR WATER-SENSITIVE MATERIALS IN AN ORGANIC CONTINUOUS PHASE microtek Laboratories, Inc. (US) 2000-03-29 EP claimed
WO-1998057737-A1 METHOD FOR MICROENCAPSULATING WATER-SOLUBLE OR WATER-DISPERSIBLE OR WATER-SENSITIVE MATERIALS IN AN ORGANIC CONTINUOUS PHASE MICROTEK LABORATORIES, INC. (US) 1998-12-23 WO claimed
US-5580844-A Encapsulated breaker chemical EXXON RESEARCH AND ENGINEERING COMPANY (US) 1996-12-03 US claimed
CN-117181179-A Synthesis device and method of silicon tetrafluoride 中船(邯郸)派瑞特种气体股份有限公司 2023-12-08 CN disclosed
US-10347531-B2 Middle of the line (MOL) contact formation method and structure GLOBALFOUNDRIES INC. (KY) 2019-07-09 US disclosed
US-20180240703-A1 MIDDLE OF THE LINE (MOL) CONTACT FORMATION METHOD AND STRUCTURE GLOBALFOUNDRIES INC. (KY) 2018-08-23 US disclosed
CN-103950948-B The preparation method of high-purity boron trifluoride-11 FANG ZHIWEN (CN) 2015-11-04 CN disclosed
CN-103950948-A Preparation method of high-purity boron trifluoride-11 FANG ZHIWEN 2014-07-30 CN disclosed
US-5180569-A Reduced emission of fluorine pollutants to environment PHOSPHATE ENGINEERING AND CONSTRUCTION COMPANY (US) 1993-01-19 US disclosed
WO-1992012095-A1 PRODUCTION OF PHOSPHORIC ACID AND HYDROGEN FLUORIDE PHOSPHATE ENGINEERING & CONSTRUCTION CORP. (US) 1992-07-23 WO disclosed
US-4917919-A Process for preventing caking of ammonium bifluoride and/or fluoride particles BAYER AKTIENGESELLSCHAFT (DE) 1990-04-17 US disclosed
CN-1005412-B Process for preparing difluorodibutyl tin powder for coating substrate, esp. glass substrate 日本板硝子株式会社 1989-10-11 CN disclosed
US-4144315-A REACTING FLUOSILICIC ACID WITH AMMONIA GOULDING CHEMICALS LIMITED (IE) 1979-03-13 US disclosed