Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.39 |
| ▸ | BLM | P54132 | 1/20 | 0.39 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.39 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | DRD3 | P35462 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9356208 | 0.97 | HSD17B10 (0.42) | MEN1POLBKMT2AHSD17B10BLM | |
| SCHEMBL26242025 | 0.97 | HSD17B10 (0.42) | MEN1POLBKMT2AHSD17B10BLM | |
| SCHEMBL9360302 | 0.97 | HSD17B10 (0.42) | MEN1POLBKMT2AHSD17B10BLM | |
| SCHEMBL29143434 | 0.94 | MEN1 (0.38) | MEN1POLBKMT2AHSD17B10BLM | |
| SCHEMBL5814986 | 0.88 | MEN1 (0.54) | MEN1POLBKMT2AHSD17B10BLM | |
| SCHEMBL9705659 | 0.88 | MEN1 (0.41) | MEN1POLBKMT2AHSD17B10BLM | |
| SCHEMBL9705218 | 0.88 | MEN1 (0.41) | MEN1POLBKMT2AHSD17B10BLM | |
| SCHEMBL9705211 | 0.88 | MEN1 (0.41) | MEN1POLBKMT2AHSD17B10BLM | |
| SCHEMBL24592071 | 0.87 | TSHR (0.52) | MEN1POLBKMT2AHSD17B10BLM | |
| SCHEMBL11101749 | 0.87 | TSHR (0.52) | MEN1POLBKMT2AHSD17B10BLM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0841325-B1 | A process for preparing methyl dithiocarbazinate by reacting methyl bromide with the reaction product of carbon disulfide and hydrazine in an aqueous medium | BAYER AG (US) | 2003-09-17 | — | — | EP | claimed |
| EP-0841325-A2 | A process for preparing methyl dithiocarbazinate by reacting methyl bromide with the reaction product of carbon disulfide and hydrazine in an aqueous medium | Bayer Corporation (US) | 1998-05-13 | — | — | EP | claimed |
| US-11777093-B2 | Polymer binder with high peel strength and application thereof in secondary lithium battery | QINGDAO INSTITUTE OF BIOENERGY AND BIOPROCESS TECHNOLOGY, CHINESE ACADEMY OF SCIENCES (CN) | 2023-10-03 | — | — | US | disclosed |
| US-8057981-B2 | Resist composition, resist protective coating composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-15 | — | — | US | disclosed |
| US-8057981-B2 | Resist composition, resist protective coating composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-15 | — | — | US | disclosed |
| US-7759047-B2 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-20 | — | — | US | disclosed |
| US-7759047-B2 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-07-20 | — | — | US | disclosed |
| US-7670750-B2 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-7670750-B2 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-20090208867-A1 | Resist Composition, Resist Protective Coating Composition, and Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090208867-A1 | Resist Composition, Resist Protective Coating Composition, and Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20080085466-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-10 | — | — | US | disclosed |
| US-20070275326-A1 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| US-20070275326-A1 | Resist protective film composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-29 | — | — | US | disclosed |
| EP-0841325-B1 | A process for preparing methyl dithiocarbazinate by reacting methyl bromide with the reaction product of carbon disulfide and hydrazine in an aqueous medium | BAYER AG (US) | 2003-09-17 | — | — | EP | disclosed |
| EP-0841324-B1 | A proces for preparing methyl dithiocarbazinate by reacting methyl bromide with the reaction product of carbon disulfide, hydrazine and an adjunct base | BAYER AG (US) | 2003-09-10 | — | — | EP | disclosed |
| US-5877339-A | Process for preparing methyl dithiocarbazinate by reacting methyl bromide with the reaction product of carbon disulfide and hydrazine in an aqueous medium | BAYER CORPORATION (US) | 1999-03-02 | — | — | US | disclosed |
| EP-0841325-A2 | A process for preparing methyl dithiocarbazinate by reacting methyl bromide with the reaction product of carbon disulfide and hydrazine in an aqueous medium | Bayer Corporation (US) | 1998-05-13 | — | — | EP | disclosed |
| EP-0841324-A2 | A proces for preparing methyl dithiocarbazinate by reacting methyl bromide with the reaction product of carbon disulfide, hydrazine and an adjunct base | Bayer Corporation (US) | 1998-05-13 | — | — | EP | disclosed |
| EP-0069343-B1 | QUATERNARY AMMONIUM SALTS AND PREPARATION THEREOF | BASF Aktiengesellschaft (DE) | 1984-11-14 | — | — | EP | disclosed |