⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4968543 | 0.74 | — | — | |
| SCHEMBL29207363 | 0.74 | — | — | |
| SCHEMBL21882137 | 0.74 | — | — | |
| SCHEMBL20906245 | 0.74 | CYP2D6 (0.34) | — | |
| L-Alaninol SCHEMBL1331749 | 0.71 | — | — | |
| L-Alaninol SCHEMBL30417235 | 0.71 | — | — | |
| L-Alaninol SCHEMBL72189 | 0.71 | — | — | |
| L-Alaninol SCHEMBL2804901 | 0.71 | TSHR (0.54) | — | |
| L-Alaninol SCHEMBL82137 | 0.71 | — | — | |
| L-Alaninol SCHEMBL30499 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2014030687-A1 | A RESIST STRIPPING SOLUTION AND A RESIST STRIP PROCESS | FUJIFILM CORPORATION (JP) | 2014-02-27 | — | — | WO | claimed |
| CN-110914326-A | Method for producing porous material | 巴斯夫欧洲公司 | 2020-03-24 | — | — | CN | disclosed |
| CN-110869407-A | Porous material having excellent reversible water absorption | 巴斯夫欧洲公司 | 2020-03-06 | — | — | CN | disclosed |
| EP-3476851-A1 | POLYCYCLIC AMINOSILANE COMPOUNDS AND MAKING METHOD | Shin-Etsu Chemical Co., Ltd. (JP) | 2019-05-01 | — | — | EP | disclosed |
| US-20190119308-A1 | POLYCYCLIC AMINOSILANE COMPOUNDS AND MAKING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-04-25 | — | — | US | disclosed |
| US-10266555-B1 | Polycyclic aminosilane compounds and making method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-04-23 | — | — | US | disclosed |
| US-20160254164-A1 | METHOD FOR STRIPPING MODIFIED RESIST, MODIFIED-RESIST STRIPPER USED THEREFOR, AND METHOD FOR MANUFACTURING SEMICONDUCTOR-SUBSTRATE PRODUCT | FUJIFILM CORPORATION (JP) | 2016-09-01 | — | — | US | disclosed |
| WO-2014030687-A1 | A RESIST STRIPPING SOLUTION AND A RESIST STRIP PROCESS | FUJIFILM CORPORATION (JP) | 2014-02-27 | — | — | WO | disclosed |
| EP-1167411-B1 | Use of reactive amines for the preparation of polyurethane foams | GOLDSCHMIDT AG TH (DE) | 2003-09-17 | — | — | EP | disclosed |
| EP-0276465-B1 | PROCESS FOR PRODUCING LIGHT FLAT ARTICLES USING AQUEOUS DISPERSIONS OR EMULSIONS OF ORGANIC COMPOUNDS CONTAINING NCO GROUPS, AND THE ARTICLES THUS PREPARED | BASF Aktiengesellschaft (DE) | 1993-02-17 | — | — | EP | disclosed |
| US-4812368-A | IMPREGNATING FOAM WITH POLYISOCYANATES | BASF AKTIENGESELLSCHAFT (DE) | 1989-03-14 | — | — | US | disclosed |
| EP-0276465-A2 | Process for producing light flat articles using aqueous dispersions or emulsions of organic compounds containing NCO groups, and the articles thus prepared | BASF Aktiengesellschaft (DE) | 1988-08-03 | — | — | EP | disclosed |