SCHEMBL7105929

SCHEMBL7105929

CC(C)CC(N)C1(O)CCC1

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.42
CYP3A4 P08684 2/20 0.42
TP53 P04637 1/20 0.42
ALOX15 P16050 1/20 0.42
SLC6A4 P31645 2/20 0.39
SLC6A3 Q01959 1/20 0.39
ALDH1A1 P00352 1/20 0.36
MAPK1 P28482 1/20 0.36
SLC6A2 P23975 1/20 0.36
ANPEP P15144 5/20 0.34
SLC7A5 Q01650 1/20 0.33
LAP3 P28838 2/20 0.32
ERAP1 Q9NZ08 2/20 0.32
ERAP2 Q6P179 1/20 0.31
CYP2D6 P10635 1/20 0.30
NFKB1 P19838 1/20 0.30
THPO P40225 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1152611 1.00 TSHR (0.42) TSHRCYP3A4TP53ALOX15SLC6A4
SCHEMBL1152831 0.95 SLC6A4 (0.42) TSHRCYP3A4TP53ALOX15SLC6A4
SCHEMBL1661017 0.95 SLC6A4 (0.42) TSHRCYP3A4TP53ALOX15SLC6A4
SCHEMBL7103362 0.93 SLC6A4 (0.45) TSHRCYP3A4TP53ALOX15SLC6A4
SCHEMBL1663593 0.93 SLC6A4 (0.45) TSHRCYP3A4TP53ALOX15SLC6A4
SCHEMBL7675403 0.93 SLC6A4 (0.45) TSHRCYP3A4TP53ALOX15SLC6A4
SCHEMBL1152845 0.93 SLC6A4 (0.45) TSHRCYP3A4TP53ALOX15SLC6A4
SCHEMBL1153373 0.72
SCHEMBL7100903 0.72
Hydrochloric Acid SCHEMBL23909486 0.70 SLC6A4 (0.39) SLC6A4SLC6A3SLC6A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100436406-C Process for producing optically active bisamidoalcohol compound SUMITOMO CHEMICAL CO (JP) 2008-11-26 CN disclosed
CN-100408553-C Method for producing optically active cycloalkylidenebisoxazoline compound and intermediate of the same SUMITOMO CHEMICAL CO (JP) 2008-08-06 CN disclosed
CN-1898196-A Process for producing optically active cycloalkylidenebisoxazoline compound and intermediate of the compound SUMITOMO CHEMICAL CO (JP) 2007-01-17 CN disclosed
CN-1898193-A Method for producing optically active bisamidealcohol compound SUMITOMO CHEMICAL CO (JP) 2007-01-17 CN disclosed
CN-1231456-C Process for preparing optically active cyclopropyl carboxylic acid derivative SUMITOMO CHEMICAL CO (JP) 2005-12-14 CN disclosed
CN-1480448-A Process for preparing optically active cyclopropyl carboxylic acid derivative ס�ѻ�ѧ��ҵ��ʽ���� 2004-03-10 CN disclosed
CN-1134422-C Optically active bisoxazoline compounds, process for their preparation and their use ������������ʽ���� 2004-01-14 CN disclosed
EP-0942010-B1 Transition metal compounds, catalyst components and catalysts for olefin polymerization, and process for producing olefinic polymer SUMITOMO CHEMICAL CO (JP) 2003-06-18 EP disclosed
US-6500909-B2 CONTAINING NICKEL, PALLADIUM, RHODIUM, RUTHENIUM, OR COBALT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-12-31 US disclosed
US-6410741-B1 INSECTICIDES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-06-25 US disclosed
US-20010027162-A1 Transition metal compound, catalyst component for olefin polymerization, catalyst for olefin polymerization, and process for producing olefinic polymer HIRAHATA WATARU (JP) 2001-10-04 US disclosed
US-6242377-B1 POLYMERIZATION IN PRESENCE OF BISOXAZOLINE WITH NICKEL, COBALT, PALLADIUM, RHODIUM, RUTHENIUM, ALUMINUM AND BORON COMPLEXES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-06-05 US disclosed
US-6072081-A Optically active bisoxazoline compounds, production and use thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-06-06 US disclosed
EP-0942010-A1 Transition metal compounds, catalyst components and catalysts for olefin polymerization, and process for producing olefinic polymers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-09-15 EP disclosed
CN-1210858-A Optically active bisoxazoline compounds, process for their preparation and their use SUMITOMO CHEMICAL CO (JP) 1999-03-17 CN disclosed