Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 5/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 4/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | CNR1 | P21554 | 3/20 | 0.34 |
| ▸ | CNR2 | P34972 | 3/20 | 0.34 |
| ▸ | NPC1 | O15118 | 3/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | HTT | P42858 | 3/20 | 0.33 |
| ▸ | RAB9A | P51151 | 3/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9297819 | 1.00 | SLC2A1 (0.42) | SLC2A1KDM4EKMT2AL3MBTL1RECQL | |
| SCHEMBL7779090 | 0.88 | SLC2A1 (0.44) | SLC2A1KDM4EKMT2AL3MBTL1GAA | |
| SCHEMBL7779116 | 0.87 | SLC2A1 (0.43) | SLC2A1KDM4EKMT2AL3MBTL1GAA | |
| SCHEMBL2255815 | 0.81 | SLC2A1 (0.48) | SLC2A1KDM4EKMT2AL3MBTL1GAA | |
| SCHEMBL2022680 | 0.81 | SLC2A1 (0.48) | SLC2A1KDM4EKMT2AL3MBTL1GAA | |
| SCHEMBL19137850 | 0.81 | SLC2A1 (0.48) | SLC2A1KDM4EKMT2AL3MBTL1GAA | |
| SCHEMBL4853552 | 0.81 | SLC2A1 (0.48) | SLC2A1KDM4EKMT2AL3MBTL1GAA | |
| SCHEMBL19137815 | 0.81 | SLC2A1 (0.48) | SLC2A1KDM4EKMT2AL3MBTL1GAA | |
| SCHEMBL3281054 | 0.81 | SLC2A1 (0.48) | SLC2A1KDM4EKMT2AL3MBTL1GAA | |
| SCHEMBL19137760 | 0.81 | SLC2A1 (0.48) | SLC2A1KDM4EKMT2AL3MBTL1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 432 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1132775-B1 | Presensitized plate useful for preparing a lithographic printing plate | FUJIFILM CORP (JP) | 2010-11-03 | — | — | EP | claimed |
| US-6593054-B2 | Comprises diazo resin, photopolymerizable resin, or photocrosslinkable resin; for increasing adhesion to aluminum substrate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-15 | — | — | US | claimed |
| US-20020064726-A1 | Presensitized plate useful for preparing a lithographic printing plate | FUJIFILM CORPORATION (JP) | 2002-05-30 | — | — | US | claimed |
| EP-1132775-A1 | Presensitized plate useful for preparing a lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2001-09-12 | — | — | EP | claimed |
| US-5080999-A | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide | FUJI PHOTO FILM CO., LTD. (JP) | 1992-01-14 | — | — | US | claimed |
| US-4172729-A | EXTENDED SHELF LIFE; LOWERED STAINING OF BACKGROUHD AREAS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-10-30 | — | — | US | claimed |
| CN-122025633-A | Polymeric adhesive for electrochemical cells including labels | 通用汽车环球科技运作有限责任公司 | 2026-05-12 | — | — | CN | disclosed |
| CN-118251759-A | Multi-level selective patterning for stacked device creation | 杰米纳蒂奥公司 | 2024-06-25 | — | — | CN | disclosed |
| CN-118215986-A | Chemoselective adhesion and strength promoters in semiconductor patterning | 杰米纳蒂奥公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-118092073-A | Photoresist underlayer composition | 罗门哈斯电子材料韩国有限公司 | 2024-05-28 | — | — | CN | disclosed |
| CN-117941029-A | Self-aligned high-order patterning based on anti-spacer | 杰米纳蒂奥公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-117941028-A | Self-aligned stacking method | 杰米纳蒂奥公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-117916854-A | Narrow line cutting mask method | 杰米纳蒂奥公司 | 2024-04-19 | — | — | CN | disclosed |
| US-4279982-A | PRINTOUTS; OXADIAZOLE PHOTOINITIATORS | FUJI PHOTO FILM CO., LTD. (JP) | 1981-07-21 | — | — | US | disclosed |
| US-4268613-A | Agent for protecting the surface of lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1981-05-19 | — | — | US | disclosed |
| US-4253999-A | Agent for protecting the surface of lithographic printing plate comprising a plasticizer containing oil phase and a surfactant and a hydrophilic high molecular weight compound containing aqueous phase | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-03 | — | — | US | disclosed |
| US-4238560-A | Photosensitive printing plate forming material having a novel matting layer composition | FUJI PHOTO FILM CO., LTD. (JP) | 1980-12-09 | — | — | US | disclosed |
| US-4232106-A | Photosensitive compositions containing 2-halomethyl-5-vinyl-1,3,4-oxadiazoles as free radical progenitors | FUJI PHOTO FILM CO., LTD. (JP) | 1980-11-04 | — | — | US | disclosed |
| US-4172729-A | EXTENDED SHELF LIFE; LOWERED STAINING OF BACKGROUHD AREAS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-10-30 | — | — | US | disclosed |
| US-4123276-A | COPOLYMER OF ACRYLIC ESTER AND NITRILE, DIAZO COMPOUND, PRINTING PLATE | FUJI PHOTO FILM CO., LTD. (JP) | 1978-10-31 | — | — | US | disclosed |