Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2061000 | 1.00 | — | — | |
| Bromide SCHEMBL1066554 | 0.97 | TSHR (0.33) | TSHR | |
| Hydrochloric Acid SCHEMBL19510268 | 0.97 | TSHR (0.33) | TSHR | |
| Hydrochloric Acid SCHEMBL7117433 | 0.97 | TSHR (0.33) | TSHR | |
| SCHEMBL1072918 | 0.87 | TSHR (0.32) | TSHR | |
| SCHEMBL306673 | 0.84 | TSHR (0.30) | TSHR | |
| Water SCHEMBL19510258 | 0.84 | TSHR (0.30) | TSHR | |
| Water SCHEMBL19583258 | 0.84 | TSHR (0.30) | TSHR | |
| Hydrochloric Acid SCHEMBL2105259 | 0.84 | TSHR (0.30) | TSHR | |
| Bromide SCHEMBL6763662 | 0.84 | SMN1; SMN2 (0.30) | TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1012392-B1 | USE OF A POLYAMMONIUM QUATERNARY POLYMER FOR CONTROLLING ANIONIC TRASH AND PITCH DEPOSITION AND TREATING COATED BROKE | ONDEO NALCO CO (US) | 2003-11-19 | — | — | EP | claimed |
| JP-55113269-A | — | — | None | — | — | JP | disclosed |
| US-11654443-B2 | Mineral processing | CIDRA MINERALS PROCESSING INC. (US) | 2023-05-23 | — | — | US | disclosed |
| US-9939729-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-04-10 | — | — | US | disclosed |
| US-9856334-B2 | Cyclopolymeric zwitterion-dianionic resin and synthesis and uses thereof | KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS (SA) | 2018-01-02 | — | — | US | disclosed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-20170197847-A1 | CYCLOPOLYMERIC ZWITTERION-DIANIONIC RESIN AND SYNTHESIS AND USES THEREOF | KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS (SA) | 2017-07-13 | — | — | US | disclosed |
| US-9651863-B2 | Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-05-16 | — | — | US | disclosed |
| US-20170113215-A1 | METHOD FOR REMOVING HEAVY METALS FROM AN AQUEOUS SOLUTION WITH CROSS-LINKED COPOLYMERS | KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS (SA) | 2017-04-27 | — | — | US | disclosed |
| US-20170075224-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170075224-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170059992-A1 | RESIST PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2017-03-02 | — | — | US | disclosed |
| US-20160114336-A1 | MINERAL PROCESSING | CIDRA MINERALS PROCESSING INC. (US) | 2016-04-28 | — | — | US | disclosed |
| US-20160041465-A1 | PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-11 | — | — | US | disclosed |
| US-20160011517-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-20160011517-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |
| US-20090174100-A1 | METHODS OF ENCAPSULATING A SUBSTANCE | NOVEL POLYMER SOLUTIONS LIMITED (GB) | 2009-07-09 | — | — | US | disclosed |
| JP-S55113269-A | CELL | YUASA BATTERY CO LTD | 1980-09-01 | — | — | JP | disclosed |