Benzene

Benzene

SCHEMBL7130232

O=C(O)Cl.O=C(O)Cl.O=C(O)Cl.c1ccccc1

nearest known ligand 0.40

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA9 Q16790 1/20 0.40
ALDH1A1 P00352 8/20 0.36
TSHR P16473 5/20 0.36
TP53 P04637 2/20 0.36
LMNA P02545 1/20 0.36
CES2 O00748 3/20 0.35
CES1 P23141 3/20 0.35
DAO P14920 1/20 0.35
NAPRT Q6XQN6 1/20 0.35
ALOX15 P16050 1/20 0.35
TRPA1 O75762 1/20 0.33
MAPK1 P28482 1/20 0.33
GSK3B P49841 1/20 0.33
HIF1A Q16665 1/20 0.33
CYP1A2 P05177 1/20 0.33
ACHE P22303 1/20 0.33
MAPT P10636 1/20 0.33
HDAC8 Q9BY41 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL9860531 1.00 CA1 (0.40) CA1CA2CA9ALDH1A1TSHR
Benzene SCHEMBL4867143 1.00 CA1 (0.40) CA1CA2CA9ALDH1A1TSHR
Benzene SCHEMBL10351213 1.00 CA1 (0.40) CA1CA2CA9ALDH1A1TSHR
Benzene SCHEMBL7059502 0.91 MAPT (0.36) CA1CA2CA9ALDH1A1TSHR
Benzene SCHEMBL10763850 0.89 CA1 (0.40) CA1CA2CA9ALDH1A1TSHR
SCHEMBL78716 0.88 CA1 (0.50) CA1CA2CA9ALDH1A1TSHR
SCHEMBL1781916 0.88
SCHEMBL9181149 0.88
SCHEMBL815 0.88
Benzene SCHEMBL4673651 0.84 CA1 (0.36) CA1CA2CA9ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118142359-A Anti-pollution and oxidation-resistant reverse osmosis membrane with low-surface-energy coating and preparation method thereof 万华化学集团股份有限公司 2024-06-07 CN claimed
CN-115738742-B Positive charged membrane for extracting lithium from salt lake and preparation method thereof 蓝星(杭州)膜工业有限公司 2023-06-13 CN disclosed
US-6582878-B2 Coating on substrate chemical amplification resist comprising alkali-soluble base resin, photoacid generator and dissolution inhibitor, exposing coating to patterning radiation to decompose dissolution inhibitor, developing with aqueous base FUJITSU LIMITED (JP) 2003-06-24 US disclosed
US-20030073027-A1 Chemical amplification resist compositions and process for the formation of resist patterns FUJITSU LIMITED (JP) 2003-04-17 US disclosed
US-6200724-B1 CHEMICAL AMPLIFICATION RESIST COMPRISES AN ALKALI-SOLUBLE BASE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION INHIBITOR, IN WHICH A CYCLIC STRUCTURE FORMS A MATRIX PORTION CONTAINS ONE LONE PAIR CONTAINING PORTION FUJITSU LIMITED (JP) 2001-03-13 US disclosed