SCHEMBL71319

SCHEMBL71319

CCCCCCCN1/C(=C\C=C(C)\C=C\c2sc3ccccc3[n+]2CCCCCCC)Sc2ccccc21

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 6/20 0.52
KMT2A Q03164 6/20 0.52
HTT P42858 5/20 0.52
BLM P54132 4/20 0.52
NPC1 O15118 5/20 0.51
RAB9A P51151 5/20 0.51
APAF1 O14727 2/20 0.51
APP P05067 2/20 0.51
ITGB2 P05107 1/20 0.51
ALPL P05186 1/20 0.51
ITGAM P11215 1/20 0.51
GFER P55789 1/20 0.51
L3MBTL1 Q9Y468 1/20 0.51
NSD2 O96028 1/20 0.51
ALDH1A1 P00352 3/20 0.50
POLB P06746 3/20 0.50
MAPT P10636 3/20 0.50
PKM P14618 3/20 0.50
SMN1; SMN2 Q16637 3/20 0.50
THRB P10828 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3934306 0.88 MEN1 (0.50) MEN1KMT2AHTTBLMNPC1
SCHEMBL3934310 0.88 MEN1 (0.50) MEN1KMT2AHTTBLMNPC1
SCHEMBL8141079 0.88 MEN1 (0.68) MEN1KMT2AHTTBLMNPC1
SCHEMBL6418025 0.88 MEN1 (0.68) MEN1KMT2AHTTBLMNPC1
SCHEMBL14429908 0.88 MEN1 (0.68) MEN1KMT2AHTTBLMNPC1
SCHEMBL14372068 0.88 MEN1 (0.68) MEN1KMT2AHTTBLMNPC1
Iodide SCHEMBL15740685 0.87 NPC1 (0.68) MEN1KMT2AHTTBLMNPC1
Iodide SCHEMBL15740687 0.87 NPC1 (0.68) MEN1KMT2AHTTBLMNPC1
SCHEMBL2044109 0.87 MEN1 (0.69) MEN1KMT2AHTTBLMNPC1
SCHEMBL16867328 0.87 MEN1 (0.69) MEN1KMT2AHTTBLMNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8906490-B2 Multicolor mask EASTMAN KODAK COMPANY (US) 2014-12-09 US disclosed
US-8715894-B2 Integrated color mask EASTMAN KODAK COMPANY (US) 2014-05-06 US disclosed
US-8664673-B2 Multicolored mask process for making display circuitry EASTMAN KODAK COMPANY (US) 2014-03-04 US disclosed
US-20120231239-A1 INTEGRATED COLOR MASK BANK OF AMERICA, N.A., AS AGENT 2012-09-13 US disclosed
US-20120181554-A1 MULTICOLORED MASK PROCESS FOR MAKING DISPLAY CIRCUITRY BANK OF AMERICA, N.A., AS AGENT 2012-07-19 US disclosed
US-8221964-B2 Integrated color mask EASTMAN KODAK COMPANY (US) 2012-07-17 US disclosed
US-8173355-B2 Gradient colored mask EASTMAN KODAK COMPANY (US) 2012-05-08 US disclosed
US-8153352-B2 Multicolored mask process for making display circuitry EASTMAN KODAK COMPANY (US) 2012-04-10 US disclosed
US-8129098-B2 Colored mask combined with selective area deposition EASTMAN KODAK COMPANY (US) 2012-03-06 US disclosed
US-7846644-B2 Photopatternable deposition inhibitor containing siloxane EASTMAN KODAK COMPANY (US) 2010-12-07 US disclosed
US-20090130398-A1 Gradient colored mask LASER PACIFIC MEDIA CORPORATION 2009-05-21 US disclosed
US-20090130397-A1 Multicolor mask BANK OF AMERICA, N.A., AS AGENT 2009-05-21 US disclosed
US-20090130600-A1 Multicolored mask process for making display circuitry QUALEX INC. 2009-05-21 US disclosed
US-20090130608-A1 PHOTOPATTERNABLE DEPOSITION INHIBITOR CONTAINING SILOXANE BANK OF AMERICA, N.A., AS AGENT 2009-05-21 US disclosed
US-20090130609-A1 Colored mask combined with selective area deposition NPEC INC. 2009-05-21 US disclosed
US-20080107878-A1 Colored mask for forming transparent structures EASTMAN KODAK COMPANY 2008-05-08 US disclosed
US-20070269750-A1 Colored masking for forming transparent structures EASTMAN KODAK COMPANY 2007-11-22 US disclosed
US-20070141485-A1 MULTILAYERED IMAGING ELEMENT CITICORP NORTH AMERICA, INC., AS AGENT 2007-06-21 US disclosed
US-7192680-B2 Method of coating a multilayered element EASTMAN KODAK COMPANY (US) 2007-03-20 US disclosed
US-7166407-B2 Imaging element having protective overcoat layers EASTMAN KODAK COMPANY (US) 2007-01-23 US disclosed