SCHEMBL714958

SCHEMBL714958

CC(=CCCCCP(=O)(O)O)C(=O)O

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 3/20 0.42
LPAR2 Q9HBW0 1/20 0.42
BTN3A1 O00481 1/20 0.41
TYMS P04818 1/20 0.41
EP300 Q09472 1/20 0.37
BBOX1 O75936 2/20 0.36
LPAR1 Q92633 1/20 0.36
LMNA P02545 1/20 0.35
CYP3A4 P08684 1/20 0.35
NFKB1 P19838 1/20 0.35
BLM P54132 1/20 0.35
PMP22 Q01453 1/20 0.35
TBXAS1 P24557 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL432856 0.94 BTN3A1 (0.42) LPAR3LPAR2BTN3A1TYMSBBOX1
SCHEMBL432855 0.94 BTN3A1 (0.42) LPAR3LPAR2BTN3A1TYMSBBOX1
SCHEMBL2142925 0.86 BTN3A1 (0.55) LPAR3LPAR2BTN3A1TYMS
SCHEMBL308196 0.86 BTN3A1 (0.55) LPAR3LPAR2BTN3A1TYMS
SCHEMBL1317422 0.83 EP300 (0.48) EP300TBXAS1
SCHEMBL1317424 0.83 EP300 (0.48) EP300TBXAS1
Hydrochloric Acid SCHEMBL28230474 0.82 BTN3A1 (0.52) BTN3A1TYMS
SCHEMBL1325679 0.81 EP300 (0.52) EP300LMNABLMTBXAS1
SCHEMBL7856915 0.81 EP300 (0.52) EP300LMNABLMTBXAS1
SCHEMBL22572624 0.81 EP300 (0.52) EP300LMNABLMTBXAS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 141 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240182745-A1 COATINGS WITH IMPROVED STAIN REMOVAL BASF SE (DE) 2024-06-06 US disclosed
US-20240150620-A1 MULTILAYER COMPOSITE WITH DUAL LAYER PRESSURE-SENSITIVE ADHESIVE BASF SE (DE) 2024-05-09 US disclosed
US-11976215-B2 Scuff resistant and chip resistant architectural compositions COLUMBIA INSURANCE COMPANY (US) 2024-05-07 US disclosed
EP-4359483-A1 COATING COMPOSITIONS WITH (STYRENE) ACRYLIC AND RUBBER BASF SE (DE) 2024-05-01 EP disclosed
WO-2024064148-A1 MAR AND SCUFF RESISTANT ARCHITECTURAL COATING BASF SE (DE) 2024-03-28 WO disclosed
EP-4320175-A1 COATINGS WITH IMPROVED STAIN REMOVAL BASF SE (DE) 2024-02-14 EP disclosed
US-11898050-B2 Scuff resistant and chip resistant architectural compositions COLUMBIA INSURANCE COMPANY (US) 2024-02-13 US disclosed
EP-4305119-A1 MULTILAYER COMPOSITE WITH DUAL LAYER PRESSURE-SENSITIVE ADHESIVE BASF SE (DE) 2024-01-17 EP disclosed
WO-2023196484-A1 DUAL CURABLE PRESSURE SENSITIVE ADHESIVE BASF SE (DE) 2023-10-12 WO disclosed
US-20230303819-A1 PROCESS FOR MAKING MULTILAYER POLYMER PARTICLES IN AQUEOUS MEDIUM BASF SE (DE) 2023-09-28 US disclosed
US-20070255000-A1 Aqueous dispersion of polymeric particles ROHM AND HAAS COMPANY 2007-11-01 US disclosed
US-7285590-B2 Improved block resistance, low temperature film formation; emulsion copolymer with units of a ethylenically unsaturated nonionic monomers, strong acid and/or a weak acid, and a keto-group containing monomer; use in solvent-free gloss paints for example HEXION SPECIALTY CHEMICALS, INC. (US) 2007-10-23 US disclosed
US-20070208129-A1 Scrub and stain-resistant coating ROHM AND HAAS COMPANY 2007-09-06 US disclosed
US-20070049671-A1 Polymer binding resins FINCH WILLIAM C 2007-03-01 US disclosed
US-20070043162-A1 Aqueous dispersion of polymeric particles ROHM AND HAAS COMPANY 2007-02-22 US disclosed
US-20070043159-A1 Aqueous dispersion of polymeric particles ROHM AND HAAS COMPANY 2007-02-22 US disclosed
US-20070010651-A1 Curable compositions comprising reactive beta-hydroxyamides from lactones FINCH WILLIAM C 2007-01-11 US disclosed
US-20070004887-A1 Method for preparing curable composition FINCH WILLIAM C 2007-01-04 US disclosed
US-20050203211-A1 Aqueous dispersion of polymeric particles GEBHARD MATTHEW S (US) 2005-09-15 US disclosed
US-20050107527-A1 Improved block resistance, low temperature film formation; emulsion copolymer with units of a ethylenically unsaturated nonionic monomers, strong acid and/or a weak acid, and a keto-group containing monomer; use in solvent-free gloss paints for example HEXION INC. (FORMERLY KNOWN AS MOMENTIVE SPECIALTY CHEMICALS INC.) 2005-05-19 US disclosed