Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MYC | P01106 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.39 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.39 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | SUMO2 | P61956 | 1/20 | 0.37 |
| ▸ | SUMO1 | P63165 | 1/20 | 0.37 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.37 |
| ▸ | SENP3 | Q9H4L4 | 1/20 | 0.37 |
| ▸ | SENP2 | Q9HC62 | 1/20 | 0.37 |
| ▸ | SENP1 | Q9P0U3 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6915063 | 0.88 | MYC (0.52) | MYCTSHRSMN1; SMN2SLC1A3SLC1A2 | |
| Benzene SCHEMBL8718895 | 0.88 | MYC (0.52) | MYCTSHRSMN1; SMN2SLC1A3SLC1A2 | |
| Benzene SCHEMBL28093278 | 0.86 | MYC (0.50) | MYCTSHRSMN1; SMN2SLC1A3SLC1A2 | |
| SCHEMBL1748 | 0.86 | MYC (0.53) | MYCTSHRSMN1; SMN2SLC1A3SLC1A2 | |
| SCHEMBL29392580 | 0.86 | MYC (0.53) | MYCTSHRSMN1; SMN2SLC1A3SLC1A2 | |
| Lithium SCHEMBL11112963 | 0.84 | MYC (0.52) | MYCTSHRSMN1; SMN2SLC1A3SLC1A2 | |
| SCHEMBL8715920 | 0.84 | MYC (0.52) | MYCTSHRSMN1; SMN2SLC1A3SLC1A2 | |
| SCHEMBL948871 | 0.84 | MYC (0.52) | MYCTSHRSMN1; SMN2SLC1A3SLC1A2 | |
| Water SCHEMBL3917281 | 0.84 | MYC (0.52) | MYCTSHRSMN1; SMN2SLC1A3SLC1A2 | |
| SCHEMBL6916771 | 0.84 | MYC (0.52) | MYCTSHRSMN1; SMN2SLC1A3SLC1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6566036-B2 | Comprising polyhydroxystyrene protected by 1-ethoxyethanol, photosensitive acid generator, solvent and polystyrene filler; dimensional and shape control of semiconductors; responsive to design rule of <0.15mu m; miniaturization | NEC ELECTRONICS CORPORATION (JP) | 2003-05-20 | — | — | US | claimed |
| US-20010009749-A1 | Chemically amplified resist | NEC CORPORATION | 2001-07-26 | — | — | US | claimed |
| JP-11307524-A | — | — | None | — | — | JP | disclosed |
| US-6566036-B2 | Comprising polyhydroxystyrene protected by 1-ethoxyethanol, photosensitive acid generator, solvent and polystyrene filler; dimensional and shape control of semiconductors; responsive to design rule of <0.15mu m; miniaturization | NEC ELECTRONICS CORPORATION (JP) | 2003-05-20 | — | — | US | disclosed |
| US-20010009749-A1 | Chemically amplified resist | NEC CORPORATION | 2001-07-26 | — | — | US | disclosed |
| JP-H11307524-A | POSITIVE TYPE RADIATION SENSITIVE COMPOSITION AND PATTERN FORMATION USING THE SAME | HITACHI LTD | 1999-11-05 | — | — | JP | disclosed |