SCHEMBL716588

SCHEMBL716588

C#CCCF

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2601645 1.00
SCHEMBL278816 0.77
SCHEMBL278952 0.77
SCHEMBL2266084 0.74
SCHEMBL18297792 0.72 CYP1A2 (0.44)
SCHEMBL111375 0.71
SCHEMBL715493 0.67
Phosphine SCHEMBL11421364 0.67
SCHEMBL10306551 0.67
Ammonia Solution, Strong SCHEMBL11048819 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8530709-B2 Process for the production of fluorinated alkenes HONEYWELL INTERNATIONAL INC. (US) 2013-09-10 US claimed
EP-2571835-A2 PROCESS FOR THE PRODUCTION OF FLUORINATED ALKENES Honeywell International, Inc. (US) 2013-03-27 EP claimed
WO-2011146802-A2 PROCESS FOR THE PRODUCTION OF FLUORINATED ALKENES HONEYWELL INTERNATIONAL INC. (US) 2011-11-24 WO claimed
US-20110288349-A1 PROCESS FOR THE PRODUCTION OF FLUORINATED ALKENES HONEYWELL INTERNATIONAL INC. (US) 2011-11-24 US claimed
EP-4747333-A1 COMPOSITIONS COMPRISING 1,1,1,4,4,4-HEXAFLUORO-2-BUTYNE The Chemours Company FC, LLC (US) 2026-05-27 EP disclosed
US-20250154409-A1 ETCHING METHOD RESONAC CORPORATION (JP) 2025-05-15 US disclosed
WO-2025019740-A1 COMPOSITIONS COMPRISING 1,1,1,4,4,4-HEXAFLUORO-2-BUTYNE THE CHEMOURS COMPANY FC, LLC (US) 2025-01-23 WO disclosed
EP-4481795-A1 ETCHING METHOD Resonac Corporation (JP) 2024-12-25 EP disclosed
WO-2023157442-A1 ETCHING METHOD 株式会社レゾナック 2023-08-24 WO disclosed
US-10651286-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2020-05-12 US disclosed
US-20190305109-A1 HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION INTERNATIONAL BUSINESS MACHINES CORPORATION 2019-10-03 US disclosed
US-10325998-B2 High selectivity nitride removal process based on selective polymer deposition INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2019-06-18 US disclosed
CN-101010311-A Azo compounds and process for production thereof TAKEDA PHARMACEUTICAL (JP) 2007-08-01 CN disclosed
CN-1297550-C Benzofuran derivatives, process for the preparation of the same and uses thereof TAKEDA CHEMICAL INDUSTRIES LTD (JP) 2007-01-31 CN disclosed
CN-1816536-A Cannabinoid receptor modulators TAKEDA CHEMICAL INDUSTRIES LTD (JP) 2006-08-09 CN disclosed
CN-1671662-A Piperidine derivatives, process for their preparation and their use TAKEDA CHEMICAL INDUSTRIES LTD (JP) 2005-09-21 CN disclosed
CN-1555369-A Process for preparing benzofuran derivatives ����ҩƷ��ҵ��ʽ���� 2004-12-15 CN disclosed
US-20040191602-A1 Crosslinkable aromatic resin having protonic acid group, and ion conductive polymer membrane, binder and fuel cell using the resin MITSUI CHEMICALS, INC. (JP) 2004-09-30 US disclosed
EP-1457511-A1 CROSSLINKABLE AROMATIC RESINS HAVING PROTONIC ACID GROUPS AND ION CONDUCTIVE POLYMER MEMBRANES BINDERS AND FUEL CELLS MADE BY USING THE SAME Mitsui Chemicals, Inc. (JP) 2004-09-15 EP disclosed
CN-1333764-A Benzofuran derivatives, their preparation and use TAKEDA CHEMICAL INDUSTRIES LTD (JP) 2002-01-30 CN disclosed