SCHEMBL7170271

SCHEMBL7170271

O=C1CCCCC(=O)OOCCCCO1

nearest known ligand 0.73

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.73
CA9 Q16790 1/20 0.73
ALDH1A1 P00352 1/20 0.43
LMNA P02545 1/20 0.43
TP53 P04637 1/20 0.43
TSHR P16473 1/20 0.43
FKBP4 Q02790 3/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3747926 0.91
SCHEMBL28712569 0.88 CA1 (0.52) CA1CA9ALDH1A1LMNATP53
SCHEMBL37722 0.85
SCHEMBL19650557 0.85 CA1 (1.00) CA1CA9ALDH1A1LMNATP53
SCHEMBL2175853 0.85
SCHEMBL189733 0.85 CA1 (1.00) CA1CA9ALDH1A1LMNATP53
SCHEMBL29528223 0.84 CA1 (0.48) CA1CA9ALDH1A1LMNATP53
SCHEMBL189541 0.83 CA1 (0.94) CA1CA9ALDH1A1LMNATP53
SCHEMBL7055908 0.83 CA1 (0.94) CA1CA9ALDH1A1LMNATP53
SCHEMBL918482 0.83 CA1 (0.94) CA1CA9ALDH1A1LMNATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118103464-A Pigment dispersion, photosensitive resin composition, cured product, black matrix, and image display device 三菱化学株式会社 2024-05-28 CN disclosed
CN-117222943-A Photosensitive coloring resin composition, cured product, partition wall and image display device 三菱化学株式会社 2023-12-12 CN disclosed
CN-116323728-A Method for producing liquid containing carboxyl group-containing resin and method for stabilizing carboxyl group-containing resin 三菱化学株式会社 2023-06-23 CN disclosed
CN-116323729-A Method for producing carboxyl group-containing resin and method for controlling molecular weight of carboxyl group-containing resin 三菱化学株式会社 2023-06-23 CN disclosed
US-6616520-B1 Polishing cloth and method for attaching/detaching the polishing cloth to/from polishing machine base plate NITTA CORPORATION (JP) 2003-09-09 US disclosed
US-6190746-B1 Polishing cloth and a method for attaching/detaching the polishing cloth to/from a base plate of a polishing machine NITTA CORP (JP) 2001-02-20 US disclosed
EP-0822884-B1 A POLISHING CLOTH AND A METHOD FOR ATTACHING/DETACHING THE POLISHING CLOTH TO/FROM A BASE PLATE OF A POLISHING MACHINE NITTA CORP (JP) 1999-12-22 EP disclosed