SCHEMBL7174010

SCHEMBL7174010

BrI.ClI.[Ag].[Ag]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8381631 0.83
SCHEMBL8090808 0.83
SCHEMBL11764025 0.82
SCHEMBL9566452 0.82
SCHEMBL272765 0.82
SCHEMBL2932486 0.82
SCHEMBL271315 0.82
SCHEMBL10421254 0.82
SCHEMBL9771245 0.82
SCHEMBL7785647 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6569612-B1 Photographic paper containing photosensitive silver halide emulsion layers, binders, azo/methine dyes and dye developers used for printing or scanning images EASTMAN KODAK COMPANY 2003-05-27 US disclosed
EP-0666497-B1 Silver halide photographic light-sensitive material KONISHIROKU PHOTO IND (JP) 1997-03-26 EP disclosed
US-5225320-A Photosensitive material includes a high-boiling solvent of a phthalate or phosphate having a dielectric constant of 3.5 or more and the stabilizing solution contains a silicone antifoam agent; high-speed automatic developers KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) 1993-07-06 US disclosed
US-3936303-A Photographic photosensitive element and developing method thereof FUJI PHOTO FILM CO., LTD. (JA) 1976-02-03 US disclosed