⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9774340 | 0.79 | — | — | |
| SCHEMBL3419721 | 0.78 | — | — | |
| SCHEMBL3275918 | 0.77 | — | — | |
| SCHEMBL9488122 | 0.75 | — | — | |
| SCHEMBL29198299 | 0.73 | — | — | |
| SCHEMBL29066665 | 0.73 | — | — | |
| SCHEMBL28494991 | 0.73 | — | — | |
| SCHEMBL7716551 | 0.73 | TSHR (0.33) | — | |
| SCHEMBL29054324 | 0.72 | — | — | |
| SCHEMBL28881873 | 0.72 | CHRM3 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0239423-A2 | Positive type radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-09-30 | — | — | EP | claimed |
| CN-116440929-B | Aluminum phosphate catalyst and preparation method and application thereof | 上海大学 | 2025-02-07 | — | — | CN | disclosed |
| CN-116440929-A | Aluminum phosphate catalyst and preparation method and application thereof | 上海大学 | 2023-07-18 | — | — | CN | disclosed |
| WO-2020042972-A1 | UREA-SUBSTITUTED AROMATIC RING-LINKED DIOXANE AND QUINAZOLINE OR QUINOLINE COMPOUND, COMPOSITION AND APPLICATION THEREOF | 北京赛特明强医药科技有限公司 | 2020-03-05 | — | — | WO | disclosed |
| EP-1341798-A1 | CHIRAL DIPHOSPHINES AND THEIR METAL COMPLEXES | PPG-Sipsy (FR) | 2003-09-10 | — | — | EP | disclosed |
| WO-2002040492-A1 | CHIRAL DIPHOSPHINES AND THEIR METAL COMPLEXES | PPG-SIPSY (FR) | 2002-05-23 | — | — | WO | disclosed |
| EP-0550009-B1 | Positive resist composition | SUMITOMO CHEMICAL CO (JP) | 1999-06-02 | — | — | EP | disclosed |
| US-5861229-A | WITH NOVOLAK RESIN AND TRIS/HYDROXYPHENYL/METHANES; BALANCE OF SENSITIVITY, RESOLUTION AND HEAT RESISTANCE; FOR COATING SILICON WAFERS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-01-19 | — | — | US | disclosed |
| EP-0358871-B1 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL CO (JP) | 1998-09-30 | — | — | EP | disclosed |
| EP-0559204-B1 | Positive type resist composition | SUMITOMO CHEMICAL CO (JP) | 1998-09-30 | — | — | EP | disclosed |
| EP-0571989-A2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-12-01 | — | — | EP | disclosed |
| EP-0559204-A1 | Positive type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-09-08 | — | — | EP | disclosed |
| EP-0550009-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-07-07 | — | — | EP | disclosed |
| US-5110706-A | Photoresists for highly reflective substrates | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-05-05 | — | — | US | disclosed |
| US-5019479-A | Photoresists for integrated circuits | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-28 | — | — | US | disclosed |
| EP-0428398-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-05-22 | — | — | EP | disclosed |
| EP-0358871-A2 | Radiation-sensitive positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-03-21 | — | — | EP | disclosed |
| EP-0239423-A2 | Positive type radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1987-09-30 | — | — | EP | disclosed |
| US-4612362-A | Thermotropic polyester-carbonates containing 2,2-dimethyl-1,3-propanediol | ALLIED CORPORATION (US) | 1986-09-16 | — | — | US | disclosed |
| US-4398018-A | Temperature stable thermotropic poly(ester carbonate) derived from t-butylhydroquinone | ALLIED CORPORATION (US) | 1983-08-09 | — | — | US | disclosed |