SCHEMBL7180964

SCHEMBL7180964

CC1C=NOC1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30528060 0.65
SCHEMBL583681 0.55
SCHEMBL1856117 0.54
SCHEMBL16204346 0.54
SCHEMBL5936329 0.53
SCHEMBL28216706 0.51
SCHEMBL11892837 0.51
SCHEMBL13946790 0.51
SCHEMBL2860232 0.51 CA1 (0.41)
SCHEMBL8104271 0.51 CA1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6579705-B2 Generating preferential amino acid sequences; obtain adjusted amino acid, incubate with enzyme, recover amino acid CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH (DE) 2003-06-17 US claimed
US-20020177196-A1 Process for preparing non-proteinogenic L-amino acids CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH 2002-11-28 US claimed
EP-1247869-A1 Process for the production of non-proteinogenic amino acids Consortium für elektrochemische Industrie GmbH (DE) 2002-10-09 EP claimed
CN-111892550-B 4-phenyl-6H-1, 3-oxazine-6-one derivatives, preparation and application thereof 苏州大学 2022-07-19 CN disclosed
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed
US-6579705-B2 Generating preferential amino acid sequences; obtain adjusted amino acid, incubate with enzyme, recover amino acid CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH (DE) 2003-06-17 US disclosed
US-20020177196-A1 Process for preparing non-proteinogenic L-amino acids CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH 2002-11-28 US disclosed
EP-1247869-A1 Process for the production of non-proteinogenic amino acids Consortium für elektrochemische Industrie GmbH (DE) 2002-10-09 EP disclosed