SCHEMBL7181801

SCHEMBL7181801

CC=C/C=[C]/CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7181796 1.00
SCHEMBL7183227 0.77
SCHEMBL2398843 0.75
SCHEMBL2398839 0.75
SCHEMBL4663512 0.73
SCHEMBL781842 0.73
SCHEMBL6294213 0.69 TSHR (0.36)
SCHEMBL6294214 0.69 TSHR (0.36)
SCHEMBL7175536 0.69
SCHEMBL7181744 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10131987-B2 Raw material for chemical deposition including organoruthenium compound, and chemical deposition method using the raw material for chemical deposition TANAKA KIKINZOKU KOGYO K.K. (JP) 2018-11-20 US disclosed
US-20170218509-A1 CHEMICAL VAPOR DEPOSITION RAW MATERIAL COMPRISING ORGANIC RUTHENIUM COMPOUND AND CHEMICAL VAPOR DEPOSITION METHOD USING CHEMICAL VAPOR DEPOSITION RAW MATERIAL TANAKA KIKINZOKU KOGYO K.K. (JP) 2017-08-03 US disclosed
EP-0938842-B1 Sustained release pheromone dispenser SHINETSU CHEMICAL CO (JP) 2003-10-15 EP disclosed
US-6355236-B2 Sustained release pheromone formation SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-03-12 US disclosed
US-20010053372-A1 SUSTAINED RELEASE PHEROMONE FORMATION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-12-20 US disclosed
EP-0938842-A1 Sustained release pheromone dispenser SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-09-01 EP disclosed