SCHEMBL718220

SCHEMBL718220

CC1=CC(C)CCC1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL720302 0.74
SCHEMBL19558050 0.74
SCHEMBL19558060 0.74
SCHEMBL17886967 0.74
SCHEMBL7698370 0.71
SCHEMBL12654600 0.70
SCHEMBL12654596 0.70
SCHEMBL710244 0.69
SCHEMBL18727585 0.69
SCHEMBL14730420 0.65 MGAM (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170204330-A1 LIQUID CRYSTAL COMPOSITION AND LIQUID CRYSTAL DISPLAY DEVICE INCLUDING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2017-07-20 US disclosed
EP-2399897-B1 METHOD FOR PRODUCING OXYGEN-CONTAINING COMPOUND UNIV UTSUNOMIYA (JP) 2015-08-12 EP disclosed
US-8716501-B2 Method for producing oxygen-containing compound UTSUNOMIYA UNIVERSITY (JP) 2014-05-06 US disclosed
US-20120053354-A1 Method for Producing Oxygen-Containing Compound UTSUNOMIYA UNIVERSITY (JP) 2012-03-01 US disclosed
EP-2399897-A1 METHOD FOR PRODUCING OXYGEN-CONTAINING COMPOUND Utsunomiya University (JP) 2011-12-28 EP disclosed
EP-2133380-A1 RESIN COMPOSITION Sumitomo Chemical Company, Limited (JP) 2009-12-16 EP disclosed
US-20090299111-A1 (ALKYLPHENYL) ALKYLCYCLOHEXANE AND METHOD FOR PRODUCING (ALKYLPHENYL) ALKYLCYCLOHEXANE OR ALKYLBIPHENYL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-12-03 US disclosed
EP-1908743-A1 (ALKYLPHENYL)ALKYLCYCLOHEXANE AND METHOD FOR PRODUCING (ALKYLPHENYL)ALKYLCYCLOHEXANE OR ALKYLBIPHENYL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-04-09 EP disclosed
US-20020025906-A1 Process for producing carbonyl or hydroxy compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-28 US disclosed
EP-0199330-B1 TRIMETHYLCYCLOHEXENE DERIVATIVES, THEIR PREPARATION AND THEIR USE AS FRAGRANCES Consortium für elektrochemische Industrie GmbH (DE) 1990-12-19 EP disclosed
US-4704477-A Trimethylcyclohexene derivatives, their preparation and use as perfume substances CONSORTIUM FUR ELEKTROCHEMISCHE INDUSTRIE GMBH (DE) 1987-11-03 US disclosed
EP-0199330-A2 Trimethylcyclohexene derivatives, their preparation and their use as fragrances Consortium für elektrochemische Industrie GmbH (DE) 1986-10-29 EP disclosed