SCHEMBL718307

SCHEMBL718307

Nc1ccc(Oc2ccc(Oc3ccc(N)c(N)c3)cc2)cc1N

nearest known ligand 0.94

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A1 P22736 1/20 0.94
ALDH1A1 P00352 8/20 0.52
TDP1 Q9NUW8 5/20 0.52
CYP3A4 P08684 3/20 0.52
TSHR P16473 2/20 0.52
SMN1; SMN2 Q16637 5/20 0.52
MEN1 O00255 3/20 0.52
KMT2A Q03164 3/20 0.52
MAPT P10636 3/20 0.52
MITF O75030 1/20 0.52
GAA P10253 1/20 0.52
GFER P55789 1/20 0.52
NLRP1 Q9C000 1/20 0.52
NOD2 Q9HC29 1/20 0.52
MAOB P27338 2/20 0.44
MAOA P21397 2/20 0.44
TEAD4 Q15561 1/20 0.42
ALOX15 P16050 2/20 0.42
TP53 P04637 1/20 0.42
THRB P10828 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11528530 1.00 NR4A1 (0.94) NR4A1ALDH1A1TDP1CYP3A4TSHR
SCHEMBL296169 0.97 NR4A1 (1.00) NR4A1ALDH1A1TDP1CYP3A4TSHR
SCHEMBL29414642 0.97 NR4A1 (1.00) NR4A1ALDH1A1TDP1CYP3A4TSHR
Hydrochloric Acid SCHEMBL1599676 0.94 NR4A1 (0.94) NR4A1ALDH1A1TDP1CYP3A4TSHR
SCHEMBL29419956 0.93 NR4A1 (0.81) NR4A1ALDH1A1TDP1CYP3A4TSHR
SCHEMBL7864120 0.93 NR4A1 (0.81) NR4A1ALDH1A1TDP1CYP3A4TSHR
SCHEMBL301889 0.93 NR4A1 (0.81) NR4A1ALDH1A1TDP1CYP3A4TSHR
SCHEMBL34467261 0.92 NR4A1 (0.90) NR4A1ALDH1A1TDP1CYP3A4TSHR
SCHEMBL29412671 0.91 NR4A1 (0.77) NR4A1ALDH1A1CYP3A4TSHRSMN1; SMN2
SCHEMBL721616 0.91 NR4A1 (0.77) NR4A1ALDH1A1CYP3A4TSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8557472-B2 Proton conducting polymer membrane, method for production thereof and fuel cell therewith TOYO BOSEKI KABUSHIKI KAISHA (JP) 2013-10-15 US disclosed
US-8216727-B2 Aromatic hydrocarbon based proton exchange membrane and direct methanol fuel cell using same TOYO BOSEKI KABUSHIKI KAISHA (JP) 2012-07-10 US disclosed
US-20120135251-A1 PHOTOSENSITIVE POLYIMIDE HAVING SILICON MODIFIED GROUP, ADHESIVE COMPOSITION AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-05-31 US disclosed
US-20120052411-A9 AROMATIC HYDROCARBON BASED PROTON EXCHANGE MEMBRANE AND DIRECT METHANOL FUEL CELL USING SAME TOYO BOSEKI KABUSHIKI KAISHA (JP) 2012-03-01 US disclosed
US-20110003234-A1 Polymer Composition, Polymer Membrane Comprising the Polymer Composition, Process for Preparing it and Fuel Cell Comprising the Membrane SOLVAY (SOCIETE ANONYME) (BE) 2011-01-06 US disclosed
EP-2247651-A1 POLYMER COMPOSITION, POLYMER MEMBRANE COMPRISING THE POLYMER COMPOSITION, PROCESS FOR PREPARING IT AND FUEL CELL COMPRISING THE MEMBRANE SOLVAY (Société Anonyme) (BE) 2010-11-10 EP disclosed
US-7799893-B2 Polybenzazole block copolymer SOLVAY (SOCIETE ANONYME) (BE) 2010-09-21 US disclosed
US-7754844-B2 Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those TOYO BOSEKI KABUSHIKI KAISHA (JP) 2010-07-13 US disclosed
EP-1561768-B1 POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE TOYO BOSEKI (JP) 2009-09-30 EP disclosed
WO-2009106554-A1 POLYMER COMPOSITION, POLYMER MEMBRANE COMPRISING THE POLYMER COMPOSITION, PROCESS FOR PREPARING IT AND FUEL CELL COMPRISING THE MEMBRANE Solvay (Société Anonyme) (BE) 2009-09-03 WO disclosed
EP-1826846-A1 AROMATIC HYDROCARBON-BASE PROTON EXCHANGE MEMBRANE AND DIRECT METHANOL FUEL CELL USING SAME Toyo Boseki Kabushiki Kasisha (JP) 2007-08-29 EP disclosed
EP-1812497-A1 POLYBENZAZOLE BLOCK COPOLYMER Solvay SA (BE) 2007-08-01 EP disclosed
US-20060166048-A1 Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those TOYO BOSEKI KABUSHIKI KAISHA (JP) 2006-07-27 US disclosed
WO-2006053808-A1 COLOUR-RECOGNITION DEVICE MAURER DAVID (CH) 2006-05-26 WO disclosed
WO-2006051064-A1 POLYBENZAZOLE BLOCK COPOLYMER Solvay (Société Anonyme) (BE) 2006-05-18 WO disclosed
EP-1657274-A1 Polybenzazole block copolymer SOLVAY (Société Anonyme) (BE) 2006-05-17 EP disclosed
EP-1354907-B1 POLYBENZAZOLE COMPOUND HAVING SULFO GROUP AND/OR PHOSPHONO GROUP, RESIN COMPOSITION CONTAINING THE SAME, MOLDED RESIN, SOLID POLYMER ELECTROLYTE FILM, SOLID ELECTROLYTE FILM/ELECTRODE CATALYST LAYER COMPOSITE, AND PROCESS FOR PRODUCING THE COMPOSITE TOYO BOSEKI (JP) 2006-03-01 EP disclosed
EP-1561768-A1 POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE Toyo Boseki Kabushiki Kaisha (JP) 2005-08-10 EP disclosed
US-20040062969-A1 Polybenzazole compound having sulfo group and/or phosphono group, resin composition containing the same, molded resin, slid polymer electrolyte film, solid electrolyte film/electrode catalyst layer composite, and process for producing the composite TOYO BOSEKI KABUSHIKI KAISHA (JP) 2004-04-01 US disclosed
EP-1354907-A1 POLYBENZAZOLE COMPOUND HAVING SULFO GROUP AND/OR PHOSPHONO GROUP, RESIN COMPOSITION CONTAINING THE SAME, MOLDED RESIN, SOLID POLYMER ELECTROLYTE FILM, SOLID ELECTROLYTE FILM/ELECTRODE CATALYST LAYER COMPOSITE, AND PROCESS FOR PRODUCING THE COMPOSITE Toyo Boseki Kabushiki Kaisha (JP) 2003-10-22 EP disclosed