⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1904642 | 0.82 | — | — | |
| SCHEMBL4106595 | 0.69 | — | — | |
| SCHEMBL2586671 | 0.67 | DPP4 (0.33) | — | |
| SCHEMBL1730783 | 0.67 | DPP4 (0.33) | — | |
| SCHEMBL2296804 | 0.67 | — | — | |
| Formamide SCHEMBL28192627 | 0.65 | — | — | |
| SCHEMBL4354074 | 0.63 | — | — | |
| SCHEMBL4354076 | 0.63 | — | — | |
| Acetonitrile SCHEMBL4016072 | 0.63 | — | — | |
| SCHEMBL27750841 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6361928-B1 | Method of defining a mask pattern for a photoresist layer in semiconductor fabrication | UNITED MICROELECTRONICS CORP. (TW) | 2002-03-26 | — | — | US | claimed |
| CN-113122032-B | Primer composition and laminate | 财团法人工业技术研究院 | 2022-03-15 | — | — | CN | disclosed |
| CN-113130113-A | Conductive material composition and conductive material prepared from same | 财团法人工业技术研究院 | 2021-07-16 | — | — | CN | disclosed |
| CN-113122032-A | Primer composition and laminate | 财团法人工业技术研究院 | 2021-07-16 | — | — | CN | disclosed |
| CN-109810222-B | Carbon fiber precursor composition and preparation method of carbon fiber precursor | 财团法人工业技术研究院 | 2021-03-30 | — | — | CN | disclosed |
| US-20200188878-A1 | MOLECULARLY IMPRINTED POLYMERS | MONASH UNIVERSITY (AU) | 2020-06-18 | — | — | US | disclosed |
| US-20160288090-A1 | MOLECULARLY IMPRINTED POLYMERS | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 2016-10-06 | — | — | US | disclosed |
| EP-2391658-B1 | MOLECULARLY IMPRINTED POLYMERS | COMMW SCIENT IND RES ORG (AU) | 2015-09-23 | — | — | EP | disclosed |
| US-20120052757-A1 | MOLECULARLY IMPRINTED POLYMERS | MONASH UNIVERSITY (AU) | 2012-03-01 | — | — | US | disclosed |
| EP-2391658-A1 | MOLECULARLY IMPRINTED POLYMERS | Commonwealth Scientific and Industrial Research Organisation (AU) | 2011-12-07 | — | — | EP | disclosed |
| EP-0875795-B1 | Image forming method featuring a residual charge control property resulting from a selected toner formulation | CANON KK (JP) | 2002-03-06 | — | — | EP | disclosed |
| US-6194061-B1 | MULTILAYER; POLYESTER GRAFT COPOLYMER LAYER OVERCOATING | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2001-02-27 | — | — | US | disclosed |
| EP-1034191-A1 | METHOD FOR PRODUCING SYNTHETIC POLYMERIZATES WITH A VERY LOW RESIDUAL MONOMER CONTENT, PRODUCTS PRODUCED ACCORDING TO THIS METHOD AND THE USE THEREOF | Stockhausen GmbH & Co. KG (DE) | 2000-09-13 | — | — | EP | disclosed |
| US-5976755-A | CHARGING; FORMING ELECTROSTATIC LATENT IMAGES; DEVELOPMENT; TRANSFERRING TO RECORDING MEDIA | CANON KABUSHIKI KAISHA (JP) | 1999-11-02 | — | — | US | disclosed |
| WO-1999026987-A1 | METHOD FOR PRODUCING SYNTHETIC POLYMERIZATES WITH A VERY LOW RESIDUAL MONOMER CONTENT, PRODUCTS PRODUCED ACCORDING TO THIS METHOD AND THE USE THEREOF | STOCKHAUSEN GMBH & CO. KG (DE) | 1999-06-03 | — | — | WO | disclosed |
| EP-0875795-A2 | Image forming method featuring a residual charge control property resulting from a selected toner formulation | CANON KABUSHIKI KAISHA (JP) | 1998-11-04 | — | — | EP | disclosed |
| US-5616436-A | IMPROVED CAPACITIES FOR DOPING AND DEDOPING OF A CELL ACTIVE SUBSTANCE, SUCH AS LITHIUM, AND SUITABLE FOR A NON-AQUEOUS SOLVENT-TYPE SECONDARY BATTERY | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1997-04-01 | — | — | US | disclosed |
| EP-0700105-A2 | Carbonaceous electrode material for secondary battery and process for production thereof | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1996-03-06 | — | — | EP | disclosed |
| US-4898998-A | BROMINATION; CATALYSIS, CONDENSATION, DEHYDROBROMINATION, BY-PRODUCT INHIBITION | TOYO SODA MANUFACTURING CO., LTD. (JP) | 1990-02-06 | — | — | US | disclosed |
| US-4868061-A | ADDITION POLYMERS, ULTRAVIOLET RADIATION STABILIZERS | THE STANDARD OIL COMPANY (US) | 1989-09-19 | — | — | US | disclosed |