Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 3/20 | 0.74 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.74 |
| ▸ | TSHR | P16473 | 1/20 | 0.74 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.74 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.68 |
| ▸ | CA3 | P07451 | 2/20 | 0.68 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.68 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.68 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.68 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.68 |
| ▸ | THRB | P10828 | 1/20 | 0.68 |
| ▸ | CA6 | P23280 | 1/20 | 0.68 |
| ▸ | CASP1 | P29466 | 1/20 | 0.68 |
| ▸ | APP | P05067 | 3/20 | 0.52 |
| ▸ | MAPT | P10636 | 4/20 | 0.48 |
| ▸ | MEN1 | O00255 | 3/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.48 |
| ▸ | ESR1 | P03372 | 2/20 | 0.45 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.45 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Diphenylsulfane SCHEMBL4163230 | 0.88 | CYP3A4 (0.59) | CYP3A4NR1H2TSHRMAPK1ALDH1A1 | |
| SCHEMBL10914949 | 0.86 | NR1H2 (1.00) | CYP3A4NR1H2TSHRMAPK1ALDH1A1 | |
| SCHEMBL29726 | 0.86 | NR1H2 (1.00) | CYP3A4NR1H2TSHRMAPK1ALDH1A1 | |
| SCHEMBL9485438 | 0.86 | CYP3A4 (1.00) | CYP3A4NR1H2TSHRMAPK1ALDH1A1 | |
| SCHEMBL9485453 | 0.86 | CYP3A4 (1.00) | CYP3A4NR1H2TSHRMAPK1ALDH1A1 | |
| SCHEMBL9647870 | 0.86 | CYP3A4 (1.00) | CYP3A4NR1H2TSHRMAPK1ALDH1A1 | |
| 4,4'-Thiodianiline SCHEMBL49068 | 0.86 | CYP3A4 (1.00) | CYP3A4NR1H2TSHRMAPK1ALDH1A1 | |
| SCHEMBL9649030 | 0.86 | CYP3A4 (1.00) | CYP3A4NR1H2TSHRMAPK1ALDH1A1 | |
| SCHEMBL10813732 | 0.86 | CYP3A4 (1.00) | CYP3A4NR1H2TSHRMAPK1ALDH1A1 | |
| SCHEMBL9649049 | 0.86 | CYP3A4 (1.00) | CYP3A4NR1H2TSHRMAPK1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 321 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117969623-A | Novel coronavirus detection electrode based on molecularly imprinted polymer and preparation method thereof | 中芯维康医疗科技(重庆)有限责任公司 | 2024-05-03 | — | — | CN | claimed |
| US-4737398-A | POLYAZOMETHYNE, POLYESTER OR POLYCARBONATE | POLYPLASTICS CO., LTD. (JP) | 1988-04-12 | — | — | US | claimed |
| US-4726998-A | LIQUID CRYSTAL POLYMER SUBSTRATE, MAGNETIC LAYER | POLYPLASTICS CO., LTD. (JP) | 1988-02-23 | — | — | US | claimed |
| US-20240191137-A1 | THERMOPLASTIC COMPOSITIONS AND USES THEREOF | SHPP GLOBAL TECHNOLOGIES B.V. (NL) | 2024-06-13 | — | — | US | disclosed |
| WO-2024095878-A1 | MODIFIER FOR THERMOPLASTIC RESIN, RESIN COMPOSITION, USE OF HYDROGENATED AROMATIC HYDROCARBON RESIN, TACKIFIER, AND PRESSURE-SENSITIVE ADHESIVE OR ADHESIVE COMPOSITION | 荒川化学工業株式会社 | 2024-05-10 | — | — | WO | disclosed |
| WO-2024095880-A1 | MODIFYING AGENT FOR THERMOPLASTIC RESINS, RESIN COMPOSITION, AND USE OF HYDROGENATED AROMATIC HYDROCARBON RESIN | 荒川化学工業株式会社 | 2024-05-10 | — | — | WO | disclosed |
| WO-2024095883-A1 | MODIFIER FOR THERMOPLASTIC RESIN, RESIN COMPOSITION, AND USE OF ROSIN RESIN | 荒川化学工業株式会社 | 2024-05-10 | — | — | WO | disclosed |
| CN-117969623-A | Novel coronavirus detection electrode based on molecularly imprinted polymer and preparation method thereof | 中芯维康医疗科技(重庆)有限责任公司 | 2024-05-03 | — | — | CN | disclosed |
| US-11866584-B2 | High-refractive-index composition, high-refractive-index film, and method for manufacturing high-refractive-index film | LG CHEM, LTD. (KR) | 2024-01-09 | — | — | US | disclosed |
| CN-115304889-A | Resin composition, molded article, and fluidity improver for low dielectric resin | 荒川化学工业株式会社 | 2022-11-08 | — | — | CN | disclosed |
| CN-111801388-B | High refractive composition, high refractive film, and method for manufacturing high refractive film | 株式会社LG化学 | 2022-04-01 | — | — | CN | disclosed |
| EP-0074700-A1 | Poly(ester amide) derived from 6-hydroxy-2-naphthoic acid, another aromatic hydroxy acid, dicarboxylic acid and an aromatic monomer capable of forming an amide link | CELANESE CORPORATION (US) | 1983-03-23 | — | — | EP | disclosed |
| EP-0067032-A1 | Poly(ester-amide) capable of forming an anisotropic melt phase derived from p-hydroxybenzoic acid, 2,6-dihydroxynaphthalene, carbocyclic dicarboxylic acid, aromatic monomer capable of forming an amide linkage and, optinally, additional aromatic diol | CELANESE CORPORATION (US) | 1982-12-15 | — | — | EP | disclosed |
| EP-0063881-A1 | Poly(ester-amide) derived from p-hydroxybenzoic acid, 2,6-naphthalene-dicarboxylic acid and aromatic monomer capable of forming an amide linkage | CELANESE CORPORATION (US) | 1982-11-03 | — | — | EP | disclosed |
| US-4355132-A | Anisotropic melt phase forming poly(ester-amide) derived from p-hydroxybenzoic acid, 2,6-naphthalenedicarboxylic acid, aromatic monomer capable of forming an amide linkage, and, optionally, hydroquinone and additional carbocyclic dicarboxylic acid | CELANESE CORPORATION (US) | 1982-10-19 | — | — | US | disclosed |
| US-4351918-A | Poly(ester-amide) capable of forming an anisotropic melt phase derived from 6-hydroxy-2-naphthoic acid, other aromatic hydroxyacid, carbocyclic dicarboxylic acid, and aromatic monomer capable of forming an amide linkage | CELANESE CORPORATION (US) | 1982-09-28 | — | — | US | disclosed |
| US-4341688-A | Poly(ester-amide) capable of forming an anisotropic melt phase derived from dihydroxyanthraquinone, hydroxybenzoic acid, dicarboxylic acid, and aromatic monomer capable of forming an amide linkage | CELANESE CORPORATION (US) | 1982-07-27 | — | — | US | disclosed |
| US-4339375-A | Poly(ester-amide) capable of forming an anisotropic melt phase derived from p-hydroxybenzoic acid, 2,6-dihydroxynaphthalene, carbocyclic dicarboxylic acid, aromatic monomer capable of forming an amide linkage, and, optionally, additional aromatic diol | CELANESE CORPORATION (US) | 1982-07-13 | — | — | US | disclosed |
| EP-0053940-A1 | Poly(ester-amide) capable of forming an anisotropic melt phase derived from 6-hydroxy-2-naphthoic acid, dicarboxylic acid and aromatic monomer capable of forming an amide linkage | CELANESE CORPORATION (US) | 1982-06-16 | — | — | EP | disclosed |
| US-4330457-A | Poly(ester-amide) capable of forming an anisotropic melt phase derived from 6-hydroxy-2-naphthoic acid, dicarboxylic acid, and aromatic monomer capable of forming an amide linkage | CELANESE CORPORATION (US) | 1982-05-18 | — | — | US | disclosed |