⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL358482 | 0.87 | — | — | |
| SCHEMBL31258463 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL28975641 | 0.58 | — | — | |
| Ethane SCHEMBL5922746 | 0.58 | — | — | |
| Hydrochloric Acid SCHEMBL28654335 | 0.58 | — | — | |
| Ethane SCHEMBL547701 | 0.58 | — | — | |
| Ethane SCHEMBL547702 | 0.58 | — | — | |
| Ethane SCHEMBL1535923 | 0.58 | — | — | |
| Ethane SCHEMBL6266512 | 0.58 | — | — | |
| Ethane SCHEMBL1535922 | 0.58 | CA4 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4397504-A1 | LITHOGRAPHIC PRINTING PLATE SUPPORT, LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE | FUJIFILM Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| US-20240217253-A1 | SUPPORT FOR LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD OF PRODUCING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-4082804-B1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING LITHOGRAPHIC PRINTING PLATE, AND PRINTING METHOD | FUJIFILM CORP (JP) | 2024-02-14 | — | — | EP | disclosed |
| EP-4269120-A1 | ORIGINAL PLATE FOR PLANOGRAPHIC PRINTING PLATE, METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE, PRINTING METHOD, AND METHOD FOR MANUFACTURING ALUMINUM SUPPORT | FUJIFILM Corporation (JP) | 2023-11-01 | — | — | EP | disclosed |
| US-20230331018-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING LITHOGRAPHIC PRINTING PLATE, PRINTING METHOD, AND METHOD OF PRODUCING ALUMINUM SUPPORT | FUJIFILM CORPORATION (JP) | 2023-10-19 | — | — | US | disclosed |
| EP-3766862-B1 | DIMETHYLCYCLOBUTANONE COMPOUNDS, DIMETHYLCYCLOBUTANE COMPOUNDS, AND PROCESSES FOR PREPARING THE SAME | SHINETSU CHEMICAL CO (JP) | 2023-06-07 | — | — | EP | disclosed |
| EP-3766861-B1 | DIESTER COMPOUND HAVING A DIMETHYLCYCLOBUTANE RING, A PROCESS FOR PREPARING THE SAME, AND A PROCESS FOR PREPARING DIMETHYLCYCLOBUTANE COMPOUND DERIVED FROM THE DIESTER COMPOUND | SHINETSU CHEMICAL CO (JP) | 2023-05-24 | — | — | EP | disclosed |
| WO-2023032992-A1 | LITHOGRAPHIC PRINTING PLATE SUPPORT, LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE | 富士フイルム株式会社 | 2023-03-09 | — | — | WO | disclosed |
| US-20220324783-A1 | DIMETHYLCYCLOBUTANONE COMPOUNDS, DIMETHYLCYCLOBUTANE COMPOUNDS, AND PROCESSES FOR PREPARING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-13 | — | — | US | disclosed |
| US-11384043-B2 | Dimethylcyclobutanone compounds, dimethylcyclobutane compounds, and processes for preparing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-12 | — | — | US | disclosed |
| EP-2339401-A1 | Method of preparing lithographic printing plate | Fujifilm Corporation (JP) | 2011-06-29 | — | — | EP | disclosed |
| WO-2011056448-A1 | VINYL ETHER COMPOUNDS AND METHODS OF THEIR PREPARATION AND USE | DOW GLOBAL TECHNOLOGIES LLC. (US) | 2011-05-12 | — | — | WO | disclosed |
| US-20110105507-A1 | VINYL ETHER COMPOUNDS AND METHODS OF THEIR PREPARATION AND USE | DOW GLOBAL TECHNOLOGIES LLC | 2011-05-05 | — | — | US | disclosed |
| US-20100221658-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20080206675-A1 | Support with hydrophilic polymer bonded to support by crosslinking and image forming layer | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-0789272-B1 | Developer for silver halide photographic photosensitive material | FUJI PHOTO FILM CO LTD (JP) | 2006-06-21 | — | — | EP | disclosed |
| US-5840472-A | DEVELOPER MIXTURE CONTAINING A MERCAPTO-PYRIMIDINE COMPOUND; REDUCING SILVER STAINS | FUJI PHOTO FILM CO., LTD. (JP) | 1998-11-24 | — | — | US | disclosed |
| EP-0789272-A1 | Developer for silver halide photographic photosensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5393655-A | High sensitivity; fog-free | FUJI PHOTO FILM CO., LTD. (JP) | 1995-02-28 | — | — | US | disclosed |
| EP-0619515-A1 | Surface latent image type silver halide photographic emulsion | FUJI PHOTO FILM CO., LTD. (JP) | 1994-10-12 | — | — | EP | disclosed |