Fluoride Ion

Fluoride Ion

SCHEMBL719923

O=[Zr+2].[F-].[F-]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL7740455 0.89
SCHEMBL31667874 0.87
Hydrochloric Acid SCHEMBL2369365 0.75
Hydrochloric Acid SCHEMBL191166 0.75
Hydrochloric Acid SCHEMBL10937409 0.75
SCHEMBL5147637 0.75
Water SCHEMBL721822 0.75
SCHEMBL7560147 0.75
Bromide SCHEMBL337779 0.75
Fluoride Ion SCHEMBL28287020 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112624192-A Method for converting zirconyl fluoride compound into anhydrous zirconium fluoride 严永生 2021-04-09 CN claimed
EP-2099723-B1 YTTRIA-BASED REFRACTORY COMPOSITION TREIBACHER IND AG (AT) 2010-08-04 EP claimed
JP-9202977-A None JP disclosed
CN-112624192-A Method for converting zirconyl fluoride compound into anhydrous zirconium fluoride 严永生 2021-04-09 CN disclosed
CN-112624192-A Method for converting zirconyl fluoride compound into anhydrous zirconium fluoride 严永生 2021-04-09 CN disclosed
CN-112624192-A Method for converting zirconyl fluoride compound into anhydrous zirconium fluoride 严永生 2021-04-09 CN disclosed
EP-1997935-B1 COMPOSITION FOR METAL SURFACE TREATMENT, METAL SURFACE TREATMENT METHOD, AND METAL MATERIAL CHEMETALL GMBH (DE) 2016-04-13 EP disclosed
US-8828151-B2 Composition for metal surface treatment, metal surface treatment method and metal material CHEMETALL GMBH (DE) 2014-09-09 US disclosed
US-8733918-B2 Image forming method FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-8613987-B2 Ink-jet recording medium FUJIFILM CORPORATION (JP) 2013-12-24 US disclosed
US-8342678-B2 Inkjet recording method and recorded article FUJIFILM CORPORATION (JP) 2013-01-01 US disclosed
US-6812354-B2 MILD CATALYTIC REDUCTION OF 3-HYDROXYMETHYLTETRAHYDROFURAN OR 3-FORMYLTETRAHYDROFURAN WITH SECONDARY ALCOHOL HYDROGEN SOURCE EASTMAN KODAK COMPANY 2004-11-02 US disclosed
US-20040122241-A1 Process for preparing 3-methyltetrahydrofuran EASTMAN CHEMICAL COMPANY 2004-06-24 US disclosed
US-20040119052-A1 Process for preparing alpha- and beta- methyl-gamma-butyrolactone and 3-methyltetrahydrofuran EASTMAN CHEMICAL COMPANY 2004-06-24 US disclosed
EP-1431295-A1 Process for the preparation of 3-methyltetrahydrofuran EASTMAN CHEMICAL COMPANY (US) 2004-06-23 EP disclosed
EP-1431296-A1 Process for preparing alpha- and beta-methyl-gamma-butyrolactone and 3-methyltetrahydrofuran EASTMAN CHEMICAL COMPANY (US) 2004-06-23 EP disclosed
JP-H09202977-A COMPOSITION AND TREATMENT FOR PASSIVATING ALUMINUM AND/ OR ZINC NIPPON PARKERIZING CO LTD 1997-08-05 JP disclosed
US-5015281-A Indium or tin fluoride as oxidant GTE LABORATORIES INCORPORATED (US) 1991-05-14 US disclosed
US-4946490-A Using indium or tin fluoride oxidant GTE LABORATORIES INCORPORATED (US) 1990-08-07 US disclosed
EP-0336280-A2 Method for preparing fluoride glasses GTE LABORATORIES INCORPORATED (US) 1989-10-11 EP disclosed