⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bicarbonate SCHEMBL7206892 | 0.86 | — | — | |
| Acetic Acid SCHEMBL5681984 | 0.84 | — | — | |
| SCHEMBL28078236 | 0.83 | MEN1 (0.35) | — | |
| SCHEMBL41707 | 0.83 | — | — | |
| SCHEMBL28263146 | 0.83 | TDP1 (0.48) | — | |
| Hydrogen Sulfide SCHEMBL7637414 | 0.80 | MEN1 (0.33) | — | |
| SCHEMBL28048009 | 0.80 | — | — | |
| Hydrochloric Acid SCHEMBL15265336 | 0.80 | — | — | |
| SCHEMBL7111250 | 0.80 | — | — | |
| SCHEMBL27820664 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6602647-B2 | Photo acid generator with high transparency and excellent heat stability in a photoresist for lithography using far ultraviolet light, especially light of ArF excimer consists of a cyclic sulfonium compound with 2-oxo group | NEC CORPORATION (JP) | 2003-08-05 | — | — | US | disclosed |
| US-20020045122-A1 | Sulfonium salt compound and resist composition and pattern forming method using the same | NEC CORPORATION | 2002-04-18 | — | — | US | disclosed |
| EP-1113334-A1 | Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition | NEC CORPORATION (JP) | 2001-07-04 | — | — | EP | disclosed |