SCHEMBL7200833

SCHEMBL7200833

[Al]C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL9055593 0.97
Carbon Monoxide SCHEMBL5518214 0.67
SCHEMBL27543165 0.67
SCHEMBL10611251 0.65
SCHEMBL4653755 0.65
Hydrochloric Acid SCHEMBL9079162 0.65
Hydrochloric Acid SCHEMBL28557769 0.65
Hydrochloric Acid SCHEMBL5349916 0.65
Hydrochloric Acid SCHEMBL20723564 0.65
SCHEMBL3993707 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6506867-B1 Ethylene polymer with low aluminum; stress resistance, nonfracturing, melt processability THE DOW CHEMICAL COMPANY 2003-01-14 US disclosed