Tetrafluoroethylene

Tetrafluoroethylene

SCHEMBL720222

FC(F)=C(F)Cl.FC(F)=C(F)F

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18665 0.94
SCHEMBL28241283 0.94 TSHR (0.30)
SCHEMBL29540244 0.89
Fluoride SCHEMBL4019630 0.89
SCHEMBL28253120 0.89
SCHEMBL6571400 0.89
SCHEMBL10647650 0.89
Methane SCHEMBL29265188 0.89
Hydrochloric Acid SCHEMBL6114301 0.89
Tetrafluoroethylene SCHEMBL28186707 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 48 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022141019-A1 COMPOSITE PARTICULATE MATERIAL, PROCESS AND USE THEREOF DUPONT ELECTRONICS, INC. (US) 2022-07-07 WO claimed
WO-2021202269-A1 DENSE MODIFIED SILICA WITH SILANE COMPOUNDS AND METHODS OF MAKING AND USING SAME SABIC GLOBAL TECHNOLOGIES, B.V. (NL) 2021-10-07 WO claimed
CN-107244122-B The multilayer structure making of layer and barrier layer including specific copolyamide 阿克马法国公司 2019-05-07 CN claimed
CN-103180380-B Fluoroelastomer Blends 优迈特株式会社 2018-07-27 CN claimed
CN-107244122-A The multilayer structure making of layer and barrier layer including specific copolyamide 阿克马法国公司 2017-10-13 CN claimed
CN-103476577-B Multilayer structure comprising a layer of a specific copolyamide and a barrier layer 阿克马法国公司 2016-07-06 CN claimed
CN-103476577-A Multilayer structure comprising a layer of a specific copolyamide and a barrier layer ARKEMA FRANCE 2013-12-25 CN claimed
US-4208455-A Method of shaping an organic polymer insoluble in a polar solvent ORONZIO DENORA IMPIANTI ELETTROCHIMICI S.P.A. (IT) 1980-06-17 US claimed
US-12624234-B2 Liquid or aerosol jet coating compositions for substrates, coated substrates and methods of coating SWIMC LLC (US) 2026-05-12 US disclosed
US-20240385559-A1 METHODS OF COATING SUBSTRATES AND COATED SUBSTRATES SWIMC LLC (US) 2024-11-21 US disclosed
CN-114728464-B Thermoplastic polymer composition for constructing 3D articles 阿科玛法国公司 2024-08-13 CN disclosed
US-20240254347-A1 LIQUID OR AEROSOL JET COATING COMPOSITIONS FOR SUBSTRATES, COATED SUBSTRATES AND METHODS OF COATING SWIMC LLC (US) 2024-08-01 US disclosed
EP-4341008-A1 LIQUID OR AEROSOL JET COATING COMPOSITIONS FOR SUBSTRATES, COATED SUBSTRATES AND METHODS OF COATING Swimc LLC (US) 2024-03-27 EP disclosed
EP-4341007-A1 METHODS OF COATING SUBSTRATES AND COATED SUBSTRATES Swimc LLC (US) 2024-03-27 EP disclosed
CN-1389947-A Membrane electrode assembly for solid polymer electrolyte fuel cell and method for manufacturing the same ASAHI GLASS CO LTD (JP) 2003-01-08 CN disclosed
EP-0934358-A4 VINYLIDENE DIFLUORIDE-BASED COATING COMPOSITIONS VALSPAR CORP (US) 2000-05-31 EP disclosed
US-6017639-A Vinylidene difluoride-based coating compositions VALSPAR CORPORATION (US) 2000-01-25 US disclosed
EP-0934358-A1 VINYLIDENE DIFLUORIDE-BASED COATING COMPOSITIONS THE VALSPAR CORPORATION (US) 1999-08-11 EP disclosed
WO-1998017723-A1 VINYLIDENE DIFLUORIDE-BASED COATING COMPOSITIONS THE VALSPAR CORPORATION (US) 1998-04-30 WO disclosed
US-5288360-A Adhesion between fluoropolymer and metal substrate MITSUBISHI PETROCHEMICAL COMPANY, LTD. (JP) 1994-02-22 US disclosed