SCHEMBL7212776

SCHEMBL7212776

CC1=C(C)C(C)(C)C([Zr]C2=C(CCN(C)C)C=CC2)=C1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7211009 0.92
SCHEMBL586968 0.85
Hydrochloric Acid SCHEMBL3677303 0.84
Fluoride SCHEMBL1130564 0.84
Hydrochloric Acid SCHEMBL6444037 0.83
SCHEMBL7541104 0.83
SCHEMBL7211827 0.82
Dimethylamine SCHEMBL7211011 0.82
Hydrochloric Acid SCHEMBL8155616 0.81
Dimethylamine SCHEMBL7211204 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6610872-B1 Zirconim complex containing a dialkylaminoalkylcyclopenta-dienyl or indenyl group and a hydorcarbon cyclopentadienyl group DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2003-08-26 US disclosed
US-6140448-A Process for preparing polysilane by catalytic dehydrogenative condensation of organosilane and metal complex catalyst therefor DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2000-10-31 US disclosed