Dimethylamine

Dimethylamine

SCHEMBL7212779

CCC1=C([Zr]C2=C(C)C(C)=C(C)C2(C)C)CC=C1.CNC

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Dimethylamine SCHEMBL7206835 0.99
Dimethylamine SCHEMBL7211011 0.89
Dimethylamine SCHEMBL7211204 0.88
SCHEMBL586968 0.84
Fluoride SCHEMBL1130564 0.83
Hydrochloric Acid SCHEMBL3677303 0.83
SCHEMBL7541104 0.82
SCHEMBL7212784 0.81
Hydrochloric Acid SCHEMBL8146878 0.80
Hydrochloric Acid SCHEMBL6444037 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6610872-B1 Zirconim complex containing a dialkylaminoalkylcyclopenta-dienyl or indenyl group and a hydorcarbon cyclopentadienyl group DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2003-08-26 US disclosed
US-6140448-A Process for preparing polysilane by catalytic dehydrogenative condensation of organosilane and metal complex catalyst therefor DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2000-10-31 US disclosed