⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8666054 | 0.78 | — | — | |
| SCHEMBL4513852 | 0.78 | — | — | |
| SCHEMBL5422745 | 0.78 | — | — | |
| SCHEMBL723878 | 0.78 | — | — | |
| SCHEMBL777413 | 0.75 | — | — | |
| SCHEMBL8637802 | 0.71 | — | — | |
| SCHEMBL4504015 | 0.71 | — | — | |
| Water SCHEMBL27581705 | 0.69 | — | — | |
| SCHEMBL25367655 | 0.66 | — | — | |
| SCHEMBL465037 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10651286-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-05-12 | — | — | US | disclosed |
| US-20190305109-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2019-10-03 | — | — | US | disclosed |
| US-10325998-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-06-18 | — | — | US | disclosed |
| US-10269924-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-04-23 | — | — | US | disclosed |
| US-20170194497-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-07-06 | — | — | US | disclosed |
| US-20170194457-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2017-07-06 | — | — | US | disclosed |
| US-9633948-B2 | Low energy etch process for nitrogen-containing dielectric layer | GLOBALFOUNDRIES INC. (KY) | 2017-04-25 | — | — | US | disclosed |
| US-9627533-B2 | High selectivity nitride removal process based on selective polymer deposition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-04-18 | — | — | US | disclosed |
| US-20160233335-A1 | HIGH SELECTIVITY NITRIDE REMOVAL PROCESS BASED ON SELECTIVE POLYMER DEPOSITION | ZEON CORPORATION (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160111374-A1 | LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER | GLOBALFOUNDRIES U.S. INC. | 2016-04-21 | — | — | US | disclosed |
| WO-2013063179-A1 | LOW ENERGY ETCH PROCESS FOR NITROGEN-CONTAINING DIELECTRIC LAYER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| WO-2013062985-A1 | HIGH FIDELITY PATTERNING EMPLOYING A FLUOROHYDROCARBON-CONTAINING POLYMER | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| WO-2013063182-A1 | HIGH SELECTIVITY NITRIDE ETCH PROCESS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-02 | — | — | WO | disclosed |
| US-20130105916-A1 | HIGH SELECTIVITY NITRIDE ETCH PROCESS | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-8216727-B2 | Aromatic hydrocarbon based proton exchange membrane and direct methanol fuel cell using same | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2012-07-10 | — | — | US | disclosed |
| US-20120052411-A9 | AROMATIC HYDROCARBON BASED PROTON EXCHANGE MEMBRANE AND DIRECT METHANOL FUEL CELL USING SAME | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20090075147-A1 | Sulfonic acid group-containing polymer, method for producing the same, resin composition containing such sulfonic acid group-containing polymer, polymer electrolyte membrane, polymer electrolyte membrane/electrode assembly, and fuel cell | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2009-03-19 | — | — | US | disclosed |
| EP-1889863-A1 | SULFONIC ACID GROUP-CONTAINING POLYMER, METHOD FOR PRODUCING SAME, RESIN COMPOSITION CONTAINING SUCH SULFONIC ACID GROUP-CONTAINING POLYMER, POLYMER ELECTROLYTE MEMBRANE, POLYMER ELECTROLYTE MEMBRANE/ELECTRODE ASSEMBLY, AND FUEL CELL | Toyo Boseki Kabushiki Kasisha (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-20070207361-A1 | AROMATIC HYDROCARBON BASED PROTON EXCHANGE MEMBRANE AND DIRECT METHANOL FUEL CELL USING SAME | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2007-09-06 | — | — | US | disclosed |
| EP-1826846-A1 | AROMATIC HYDROCARBON-BASE PROTON EXCHANGE MEMBRANE AND DIRECT METHANOL FUEL CELL USING SAME | Toyo Boseki Kabushiki Kasisha (JP) | 2007-08-29 | — | — | EP | disclosed |