SCHEMBL721745

SCHEMBL721745

CCCCCCCCCCCCCCCOC(=O)NN

nearest known ligand 0.68

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.68
ACHE P22303 12/20 0.60
NAAA Q02083 1/20 0.55
TSHR P16473 2/20 0.50
FAAH O00519 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28164347 1.00 EPHX1 (0.68) EPHX1ACHENAAATSHRFAAH
SCHEMBL28085686 1.00 EPHX1 (0.68) EPHX1ACHENAAATSHRFAAH
SCHEMBL28164860 1.00 EPHX1 (0.68) EPHX1ACHENAAATSHRFAAH
SCHEMBL28164866 1.00 EPHX1 (0.68) EPHX1ACHENAAATSHRFAAH
SCHEMBL723173 1.00 EPHX1 (0.68) EPHX1ACHENAAATSHRFAAH
SCHEMBL10878591 1.00 EPHX1 (0.68) EPHX1ACHENAAATSHRFAAH
SCHEMBL28164348 1.00 EPHX1 (0.68) EPHX1ACHENAAATSHRFAAH
SCHEMBL28164343 1.00 EPHX1 (0.68) EPHX1ACHENAAATSHRFAAH
SCHEMBL18641585 1.00 EPHX1 (0.68) EPHX1ACHENAAATSHRFAAH
SCHEMBL28164392 1.00 EPHX1 (0.68) EPHX1ACHENAAATSHRFAAH

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7947637-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2011-05-24 US claimed
EP-2041776-A2 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FujiFilm Electronic Materials USA, Inc. (US) 2009-04-01 EP claimed
WO-2008005354-A2 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-01-10 WO claimed
US-20080004197-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2008-01-03 US claimed
CN-109642086-A resin composition and use thereof 住友化学株式会社 2019-04-16 CN disclosed
CN-109311270-A Laminate, building material, building, and heat-insulating container 住友化学株式会社 2019-02-05 CN disclosed
CN-109312167-A Resin combination and its application 住友化学株式会社 2019-02-05 CN disclosed
CN-109312017-A Polymer, molded article, foam, resin composition, and method for producing polymer 住友化学株式会社 2019-02-05 CN disclosed
CN-108291091-A Resin product and drug effect component slow release equipment 住友化学株式会社 2018-07-17 CN disclosed
CN-107001524-A Polymer 住友化学株式会社 2017-08-01 CN disclosed
US-20120048295-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2012-03-01 US disclosed
US-7947637-B2 Cleaning formulation for removing residues on surfaces FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2011-05-24 US disclosed
WO-2010104816-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2010-09-16 WO disclosed
EP-2041776-A2 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FujiFilm Electronic Materials USA, Inc. (US) 2009-04-01 EP disclosed
WO-2008005354-A2 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-01-10 WO disclosed
US-20080004197-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2008-01-03 US disclosed