SCHEMBL722337

SCHEMBL722337

CCC(O)OC(C)N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3292608 0.83
SCHEMBL93793 0.78
SCHEMBL6716479 0.78
SCHEMBL11504928 0.78
SCHEMBL38573 0.77
SCHEMBL732555 0.77
SCHEMBL10436477 0.77
SCHEMBL4955122 0.74
SCHEMBL12324424 0.74
SCHEMBL16449014 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120048295-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2012-03-01 US disclosed
US-4933398-A 2-CARBOXY(ALKYL) SUBSTITUTED ANTHRAQUINONE, HYDROXY-CONTAINING AMINE CIBA-GEIGY CORPORATION (US) 1990-06-12 US disclosed
US-4927865-A CURABLE EPOXY RESINS CIBA-GEIGY CORPORATION (US) 1990-05-22 US disclosed
US-4924015-A PREPARING METALLIC COATINGS AND IMAGES CIBA-GEIGY CORPORATION (US) 1990-05-08 US disclosed
US-4855084-A PHOTOSENSITIVE COMPOSITIONS CIBA-GEIGY CORPORATION (US) 1989-08-08 US disclosed
EP-0204497-A1 Polymerisation process employing compounds having polymerisable acylurethane structures Nippon Paint Co., Ltd. (JP) 1986-12-10 EP disclosed
US-3994882-A ANTIMICROBIAL KABUSHIKI KAISHA UENO SEIYAKU OYO KENKYUJO (JA) 1976-11-30 US disclosed