Oxalic Acid

Oxalic Acid

SCHEMBL722350

O.O=C([O-])C(=O)[O-].O=C([O-])C(=O)[O-].O=C([O-])C(=O)[O-].[Nd+3].[Nd+3]

nearest known ligand 0.70

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

OPRM1SLC6A4

The experimentally established mechanism targets of Oxalic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CA4 P22748 5/20 0.70
FAHD1 Q6P587 1/20 0.70
MEN1 O00255 1/20 0.43
LDHA P00338 1/20 0.43
BLM P54132 1/20 0.43
KMT2A Q03164 1/20 0.43
CA1 P00915 2/20 0.42
LMNA P02545 2/20 0.33
CASP1 P29466 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Oxalic Acid SCHEMBL2546775 1.00 CA4 (0.70) CA4FAHD1MEN1LDHABLM
Oxalic Acid SCHEMBL7981840 0.94 CA4 (0.78) CA4FAHD1MEN1LDHABLM
Oxalic Acid SCHEMBL234978 0.94 CA4 (0.78) CA4FAHD1MEN1LDHABLM
Oxalic Acid SCHEMBL153033 0.94 CA4 (0.78) CA4FAHD1MEN1LDHABLM
Oxalic Acid SCHEMBL169342 0.94
Oxalic Acid SCHEMBL28387560 0.94 CA4 (0.78) CA4FAHD1MEN1LDHABLM
Oxalic Acid SCHEMBL2722478 0.94 CA4 (0.78) CA4FAHD1MEN1LDHABLM
Oxalic Acid SCHEMBL7620105 0.94 CA4 (0.78) CA4FAHD1MEN1LDHABLM
Oxalic Acid SCHEMBL25291950 0.89 CA4 (0.70) CA4FAHD1MEN1LDHABLM
Oxalic Acid SCHEMBL23794556 0.89 CA4 (0.70) CA4FAHD1MEN1LDHABLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8765028-B2 Composition for oxide thin film, method of preparing the composition, method of forming the oxide thin film, and electronic device using the composition INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2014-07-01 US claimed
US-20120049181-A1 COMPOSITION FOR OXIDE THIN FILM, METHOD OF PREPARING THE COMPOSITION, METHOD OF FORMING THE OXIDE THIN FILM, AND ELECTRONIC DEVICE USING THE COMPOSITION INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2012-03-01 US claimed
US-11607734-B2 Methods for the production of fine metal powders from metal compounds HELA NOVEL METALS LLC (US) 2023-03-21 US disclosed
EP-3802893-A1 METHODS FOR THE PRODUCTION OF FINE METAL POWDERS FROM METAL COMPOUNDS Hela Novel Metals LLC (US) 2021-04-14 EP disclosed
CN-109490374-B Cross sensitive material for formaldehyde, benzene, ammonia and carbon monoxide in air 北京联合大学 2020-11-13 CN disclosed
US-20200047256-A1 METHODS FOR THE PRODUCTION OF FINE METAL POWDERS FROM METAL COMPOUNDS HELA Holdings LLC 2020-02-13 US disclosed
US-9558941-B2 Method of forming oxide thin film and method of fabricating oxide thin film transistor using hydrogen peroxide INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2017-01-31 US disclosed
US-20150011045-A1 METHOD OF FORMING OXIDE THIN FILM AND METHOD OF FABRICATING OXIDE THIN FILM TRANSISTOR USING HYDROGEN PEROXIDE INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2015-01-08 US disclosed
US-8765028-B2 Composition for oxide thin film, method of preparing the composition, method of forming the oxide thin film, and electronic device using the composition INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2014-07-01 US disclosed
US-8742414-B2 Composition for an oxide thin film, a preparation method of the composition, a method for forming an oxide thin film using the composition, an electronic device including the oxide thin film, and a semiconductor device including the oxide thin film INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2014-06-03 US disclosed
US-8536570-B2 Composition for oxide thin film, preparation method of the composition, methods for forming the oxide thin film using the composition, and electronic device using the composition INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2013-09-17 US disclosed
US-20120168747-A1 COMPOSITION FOR OXIDE THIN FILM, PREPARATION METHOD OF THE COMPOSITION, METHODS FOR FORMING THE OXIDE THIN FILM USING THE COMPOSITION, AND ELECTRONIC DEVICE USING THE COMPOSITION INDUSTRY-ACADEMIC CORPORATION FOUNDATION, YONSEI UNIVERSITY (KR) 2012-07-05 US disclosed
US-20120049181-A1 COMPOSITION FOR OXIDE THIN FILM, METHOD OF PREPARING THE COMPOSITION, METHOD OF FORMING THE OXIDE THIN FILM, AND ELECTRONIC DEVICE USING THE COMPOSITION INDUSTRY-ACADEMIC COOPERATION FOUNDATION, YONSEI UNIVERSITY (KR) 2012-03-01 US disclosed
EP-1257377-A4 RAPID CONVERSION OF METAL-CONTAINING COMPOUNDS TO FORM METALS OR METAL OXIDES OMG AMERICAS INC (US) 2004-04-21 EP disclosed
US-6689191-B2 DECOMPOSITION, OXIDATION, AND REDUCTION; CAN BE SIMULTANEOUS OMG AMERICAS, INC. 2004-02-10 US disclosed
US-20030230169-A1 Rapid conversion of metal-containing compounds to form metal oxides DUNMEAD STEPHEN (US) 2003-12-18 US disclosed
CN-1419482-A Rapid conversion of metal-containing compounds to form metals or metal oxides OMG AMERICAS INC (US) 2003-05-21 CN disclosed
US-20030019328-A1 Rapid conversion of metal-containing compounds to form metals or metal oxides THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE 2003-01-30 US disclosed
EP-1257377-A1 RAPID CONVERSION OF METAL-CONTAINING COMPOUNDS TO FORM METALS OR METAL OXIDES OMG Americas, Inc. (US) 2002-11-20 EP disclosed
WO-2001062421-A1 RAPID CONVERSION OF METAL-CONTAINING COMPOUNDS TO FORM METALS OR METAL OXIDES OMG AMERICAS, INC. (US) 2001-08-30 WO disclosed