Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 13/20 | 0.57 |
| ▸ | ESR2 | Q92731 | 13/20 | 0.57 |
| ▸ | GAA | P10253 | 8/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.57 |
| ▸ | MEN1 | O00255 | 5/20 | 0.57 |
| ▸ | MAPT | P10636 | 3/20 | 0.57 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.57 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.57 |
| ▸ | JAK2 | O60674 | 1/20 | 0.57 |
| ▸ | USP2 | O75604 | 1/20 | 0.57 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.57 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.57 |
| ▸ | POLB | P06746 | 2/20 | 0.54 |
| ▸ | ELANE | P08246 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | PGR | P06401 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10870084 | 0.91 | ELANE (0.47) | ESR1ESR2GAAKMT2AMEN1 | |
| SCHEMBL30226566 | 0.90 | ESR1 (0.49) | ESR1ESR2GAAKMT2AMEN1 | |
| SCHEMBL4824369 | 0.90 | ESR1 (0.49) | ESR1ESR2GAAKMT2AMEN1 | |
| SCHEMBL14973546 | 0.87 | ELANE (0.45) | ESR1ESR2GAAKMT2AMEN1 | |
| SCHEMBL13588210 | 0.86 | HTT (0.47) | ESR1ESR2GAAKMT2AMEN1 | |
| SCHEMBL11963911 | 0.85 | ESR1 (0.47) | ESR1ESR2GAAKMT2AMEN1 | |
| SCHEMBL92351 | 0.85 | ESR1 (0.42) | ESR1ESR2GAAKMT2AMEN1 | |
| SCHEMBL217074 | 0.85 | ESR1 (0.46) | ESR1ESR2GAAKMT2AMEN1 | |
| SCHEMBL10040393 | 0.84 | ESR1 (0.43) | ESR1ESR2GAAKMT2AMEN1 | |
| SCHEMBL4823898 | 0.84 | ESR1 (0.44) | ESR1ESR2GAAKMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 361 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7439302-B2 | Low refractive index polymers as underlayers for silicon-containing photoresists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-10-21 | — | — | US | claimed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027908-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11801333-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11801333-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11786160-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| US-11786160-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| WO-2023140191-A1 | ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2023-07-27 | — | — | WO | disclosed |
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| US-11071485-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-07-27 | — | — | US | disclosed |
| US-7183036-B2 | Low activation energy positive resist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-02-27 | — | — | US | disclosed |
| US-7129016-B2 | Positive resist containing naphthol functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-10-31 | — | — | US | disclosed |
| WO-2006096221-A1 | LOW REFRACTIVE INDEX POLYMERS AS UNDERLAYERS FOR SILICON-CONTAINING PHOTORESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-09-14 | — | — | WO | disclosed |
| US-20060134547-A1 | Low refractive index polymers as underlayers for silicon-containing photoresists | GLOBALFOUNDRIES U.S. INC. | 2006-06-22 | — | — | US | disclosed |
| US-20060134546-A1 | Low refractive index polymers as underlayers for silicon-containing photoresists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-06-22 | — | — | US | disclosed |
| CN-1790163-A | Positive resist containing naphthol functionality | IBM (US) | 2006-06-21 | — | — | CN | disclosed |
| US-20060105267-A1 | Positive resist containing naphthol functionality | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2006-05-18 | — | — | US | disclosed |
| US-20060105266-A1 | Low activation energy positive resist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-05-18 | — | — | US | disclosed |
| US-20040102601-A1 | Useful as overcoating materials and interlayer insulating materials for wiring boards | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2004-05-27 | — | — | US | disclosed |
| EP-1375553-A1 | CURABLE RESIN, CURABLE RESIN MATERIAL, CURABLE FILM, AND INSULATOR | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |