SCHEMBL725916

SCHEMBL725916

[Hg+2].[O-][O-]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Silver SCHEMBL4246340 0.87
SCHEMBL992944 0.67
SCHEMBL273023 0.67
SCHEMBL10544157 0.67
SCHEMBL2564053 0.67
SCHEMBL345686 0.67
SCHEMBL6672285 0.67
Magnesium Peroxide SCHEMBL28984 0.67
SCHEMBL57961 0.67
SCHEMBL531297 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 137 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1192234-C Photometric detection system and method for gas TRACE ANALYSIS CO (US) 2005-03-09 CN claimed
CN-1271858-A Photometric detection system and method for gas TRACE ANALYSIS CO (US) 2000-11-01 CN claimed
JP-2114449-A None JP disclosed
JP-52101430-A None JP disclosed
JP-52148172-A None JP disclosed
US-12029633-B2 Absorbent article with a fluid entangled body facing material including a plurality of projections KIMBERLY-CLARK WORLDWIDE, INC. (US) 2024-07-09 US disclosed
US-11857385-B2 Method of producing plate denture, curable composition for stereolithography, and plate denture production kit TOKUYAMA DENTAL CORPORATION (JP) 2024-01-02 US disclosed
CN-114929158-B Method for producing denture, curable composition for photoforming, and kit for producing denture 株式会社德山齿科 2023-10-20 CN disclosed
US-11763998-B1 Solid electrolytic capacitor KYOCERA AVX Components Corporation (US) 2023-09-19 US disclosed
US-11753423-B2 Method for producing herbicide intermediate MMAG Co. Ltd (JP) 2023-09-12 US disclosed
US-11756742-B1 Tantalum capacitor with improved leakage current stability at high temperatures KYOCERA AVX Components Corporation (US) 2023-09-12 US disclosed
WO-2000051654-A1 ARTICLES HAVING AN ODOUR CONTROL SYSTEM THE PROCTER & GAMBLE COMPANY (US) 2000-09-08 WO disclosed
WO-2000051652-A1 ARTICLES HAVING AN ODOUR CONTROL SYSTEM THE PROCTER & GAMBLE COMPANY (US) 2000-09-08 WO disclosed
US-5346883-A Molecular orientation THE FURUKAWA ELECTRIC CO., LTD. (JP) 1994-09-13 US disclosed
JP-H02114449-A ALKALINE BATTERY AND ITS MANUFACTURE MATSUSHITA ELECTRIC IND CO LTD 1990-04-26 JP disclosed
CN-1032879-A Make the method for superconductive products FURUKAWA ELECTRIC CO LTD (JP) 1989-05-10 CN disclosed
EP-0304076-A2 Method of manufacturing superconductive products THE FURUKAWA ELECTRIC CO., LTD. (JP) 1989-02-22 EP disclosed
JP-S52148172-A ELECTRONIC WATCH SEIKO INSTR & ELECTRONICS LTD 1977-12-09 JP disclosed
JP-S52101430-A MERCURY PEROXIDE BATTERY SEIKO INSTR & ELECTRONICS 1977-08-25 JP disclosed
US-3932503-A Benzenesulfonyl ureas HOECHST AKTIENGESELLSCHAFT (DT) 1976-01-13 US disclosed