SCHEMBL72618

SCHEMBL72618

C=CCCC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL3124712 0.97
SCHEMBL15016240 0.89 TSHR (0.35)
SCHEMBL28982149 0.84 TSHR (0.32)
SCHEMBL55744 0.81
SCHEMBL3250029 0.80 TSHR (0.42)
Ammonia Solution, Strong SCHEMBL3112805 0.79
SCHEMBL1760678 0.79
SCHEMBL23986554 0.78
SCHEMBL1454889 0.78
SCHEMBL8539928 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 6282 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260055260-A1 STABILIZER FOR SUPPRESSING GENERATION OF SILANE FROM A POLYSILANE COMPOSITION AND METHOD FOR SUPPRESSING GENERATION OF SILANE MERCK PATENT GMBH (DE) 2026-02-26 US claimed
EP-4077570-B1 HOT MELT ADHESIVE COMPOSITION BOSTIK SA (FR) 2025-10-29 EP claimed
EP-4263653-B1 METHOD FOR PREPARING A MONOL OR POLYOL COMPRISING A POLYOXYMETHYLENE BLOCK POWER2POLYMERS GMBH (DE) 2025-09-03 EP claimed
US-12359102-B2 Hot melt adhesive composition BOSTIK SA (FR) 2025-07-15 US claimed
CN-120059436-A High-transparency scratch-resistant polycarbonate material 厦门天宇新材料科技有限公司 2025-05-30 CN claimed
CN-119431716-A Modified polyurethane, preparation method and application thereof, self-repairing antibacterial photo-curing coating composition, preparation method and application thereof and product 中国石油化工股份有限公司 2025-02-14 CN claimed
CN-119431714-A Polymer, preparation method and application thereof, self-repairing antibacterial photo-curing coating composition, preparation method and application thereof and product 中国石油化工股份有限公司 2025-02-14 CN claimed
CN-118084726-A 1-Cyano-2-hydroxy-5-fluoro compound and preparation method thereof 南京工业大学 2024-05-28 CN claimed
CN-115298266-B Stabilizer for inhibiting silane production from polysilane composition and method for inhibiting silane production 默克专利有限公司 2024-05-28 CN claimed
CN-112437790-B Polyolefin blend composition 埃克森美孚化学专利公司 2024-04-23 CN claimed
US-4533731-A ANTIINFLAMMATORY AGENTS ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1985-08-06 US claimed
EP-0146051-A2 Stand-off device with special fluid Hewlett-Packard Company (US) 1985-06-26 EP claimed
US-4525486-A Process for preparing modified polyolefin particles and foamed article made from the particles KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1985-06-25 US claimed
EP-0049779-B1 3-AMINOINDAZOLE DERIVATIVES AND PROCESS FOR PREPARATION THEREOF Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1984-10-31 EP claimed
US-4474964-A 3-Aminoindazole derivatives ASAHI, KASEI, KOGYO, KABUSHIKI, KAISHA (JP) 1984-10-02 US claimed
EP-0110151-A1 Process for preparing modified polyolefin particles and foamed article made from the particles KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1984-06-13 EP claimed
EP-0090972-A2 Indazole derivatives Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1983-10-12 EP claimed
US-4396706-A ADDITION INTERPOLYMER PARTICLES, MATTES FUJI PHOTO FILM CO., LTD. (JP) 1983-08-02 US claimed
EP-0049779-A1 3-Aminoindazole derivatives and process for preparation thereof Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1982-04-21 EP claimed
US-4205021-A LINEAR, LOW DENSITY, FILMS WITH HIGH TEAR AND IMPACT RESISTANCE AND HIGH TRANSPARENCY MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1980-05-27 US claimed