Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Carbon Tetrachloride. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Carbon Tetrachloride SCHEMBL11539204 | 0.95 | TSHR (0.36) | — | |
| Dimethyl Sulfoxide SCHEMBL31074730 | 0.84 | — | — | |
| Dimethyl Sulfoxide SCHEMBL59 | 0.78 | — | — | |
| Dimethyl Sulfoxide SCHEMBL16720928 | 0.78 | — | — | |
| Dimethyl Sulfoxide SCHEMBL14248079 | 0.78 | — | — | |
| Dimethyl Sulfoxide SCHEMBL17141374 | 0.78 | — | — | |
| Dimethyl Sulfoxide SCHEMBL3409 | 0.78 | — | — | |
| Dimethyl Sulfoxide SCHEMBL2856303 | 0.78 | — | — | |
| SCHEMBL12572407 | 0.76 | — | — | |
| Dimethyl Sulfoxide SCHEMBL177046 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104016960-B | A kind of heterocyclic compound and application thereof | 华东理工大学 | 2018-03-23 | — | — | CN | disclosed |
| CN-103965218-B | A kind of heterocyclic compound and application thereof | 华东理工大学 | 2017-11-03 | — | — | CN | disclosed |
| CN-104016985-B | A kind of Pyrazolopyrimidine compound and application thereof | 华东理工大学 | 2017-11-03 | — | — | CN | disclosed |
| CN-103664795-B | Pyridazinone compound and application thereof | 华东理工大学 | 2017-10-03 | — | — | CN | disclosed |
| CN-103509039-B | Thieno thiadiazoles derivative and its application as Plant activator | 华东理工大学 | 2017-07-28 | — | — | CN | disclosed |
| CN-103664823-B | Arylamine replaces 1,2,3,4 thiatriazole derivatives, Preparation Method And The Use | 华东理工大学 | 2017-05-31 | — | — | CN | disclosed |
| CN-102292338-B | Tyrosine kinase protein receptor antagonists | 萌蒂制药国际有限公司 | 2016-09-28 | — | — | CN | disclosed |
| CN-102532162-A | 2,3-dihydro-6-nitroimidazo[2,1-b]oxazoles | OTSUKA PHARMA CO LTD | 2012-07-04 | — | — | CN | disclosed |
| CN-1914147-A | Adamantane derivative and process for producing the same | IDEMITSU KOSAN CO (JP) | 2007-02-14 | — | — | CN | disclosed |
| US-20030196989-A1 | Selective & damage free Cu cleaning process for pre-dep, post etch/CMP | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. | 2003-10-23 | — | — | US | disclosed |
| CN-1209798-A | Dihalopropene compounds, their use as insecticides/acaricides and intermediates for their production | SUMITOMO CHEMICAL CO (JP) | 1999-03-03 | — | — | CN | disclosed |
| US-5863307-A | Method and slurry composition for chemical-mechanical polish (CMP) planarizing of copper containing conductor layers | CHARTERED SEMICONDUCTOR MANUFACTURING, LTD. (SG) | 1999-01-26 | — | — | US | disclosed |
| US-5780358-A | Method for chemical-mechanical polish (CMP) planarizing of cooper containing conductor layers | CHARTERED SEMICONDUCTOR MANUFACTURING LTD. (SG) | 1998-07-14 | — | — | US | disclosed |
| WO-1991008914-A1 | COPPER ETCHING SOLUTION AND METHOD | MICROELECTRONICS AND COMPUTER TECHNOLOGY CORPORATION (US) | 1991-06-27 | — | — | WO | disclosed |