SCHEMBL727620

SCHEMBL727620

FC1(F)CC(F)(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL424207 0.90
SCHEMBL471759 0.86 MEN1 (0.36)
SCHEMBL8204701 0.86 MEN1 (0.36)
SCHEMBL1897021 0.84
Iodide SCHEMBL11600703 0.82 MEN1 (0.33)
SCHEMBL6306884 0.78
Methyl Alcohol SCHEMBL10411216 0.76
SCHEMBL63852 0.70
SCHEMBL6408391 0.68
SCHEMBL7094993 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 694 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12410368-B2 Etching gas composition, substrate processing apparatus, and pattern forming method using the etching gas composition SEMES CO., LTD. (KR) 2025-09-09 US claimed
US-20250279281-A1 HALOGEN GAS MIXTURES FOR THROUGH-SUBSTRATE ETCHING TOKYO ELECTRON LIMITED (JP) 2025-09-04 US claimed
US-12183591-B2 Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-12-31 US claimed
US-20240392192-A1 ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME SEMES CO., LTD. (KR) 2024-11-28 US claimed
US-20240392191-A1 ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME SEMES CO., LTD. (KR) 2024-11-28 US claimed
CN-118851867-A Method for preparing hexafluorobutadiene 中船(邯郸)派瑞特种气体股份有限公司 2024-10-29 CN claimed
US-20230407175-A1 ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE ETCHING GAS COMPOSITION SEMES CO LTD (KR) 2023-12-21 US claimed
US-20230407177-A1 ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE ETCHING GAS COMPOSITION SEMES CO., LTD. (KR) 2023-12-21 US claimed
US-20230407179-A1 ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE ETCHING GAS COMPOSITION SEMES CO., LTD. (KR) 2023-12-21 US claimed
US-20230313039-A1 ETCHING GAS COMPOSITION, SUBSTRATE PROCESSING APPARATUS, AND PATTERN FORMING METHOD USING THE SAME SEMES CO., LTD. (KR) 2023-10-05 US claimed
EP-0241010-B1 REDUCED REACTIVITY POLYOLS AS FOAM CONTROLLERS IN PRODUCING POLYURETHANES FOAMS UNION CARBIDE CORPORATION (US) 1992-01-29 EP claimed
US-4701474-A ALKENOIC ACID GRAFTED POLYETHERS UNION CARBIDE CORPORATION (US) 1987-10-20 US claimed
EP-0241010-A1 Reduced reactivity polyols as foam controllers in producing polyurethanes foams UNION CARBIDE CORPORATION (US) 1987-10-14 EP claimed
US-4686240-A ALKALI OR ALKALINE EARTH METAL SALT OF A BRONSTED ACID UNION CARBIDE CORPORATION (US) 1987-08-11 US claimed
EP-0220697-A2 Process for producing polyurethane foams using foam modifiers UNION CARBIDE CORPORATION (US) 1987-05-06 EP claimed
US-4454052-A A HALOGENATED HYDROCARBON, A POLYETHYLENE GLYCOL METHYL ETHER AND A PHOSPHITE ESTER, EPOXY COMPOUND, OR ORGANOTIN STABILIZER HITACHI, LTD. (JP) 1984-06-12 US claimed
WO-1980001824-A1 ASYMMETRIC PERMEABLE MEMBER DEUTSCH D 1980-09-04 WO claimed
WO-1980001825-A1 ASYMMETRIC PERMEABLE MEMBER DEUTSCH D 1980-09-04 WO claimed
US-4147480-A Asymmetric permeable member DEUTSCH DANIEL HAROLD 1979-04-03 US claimed
US-4147481-A Asymmetric permeable member DEUTSCH DANIEL HAROLD 1979-04-03 US claimed