⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12396027 | 0.88 | — | — | |
| SCHEMBL27627718 | 0.87 | — | — | |
| SCHEMBL35695 | 0.85 | — | — | |
| SCHEMBL26328853 | 0.82 | — | — | |
| SCHEMBL11407685 | 0.81 | — | — | |
| SCHEMBL3911468 | 0.81 | — | — | |
| Fluoride SCHEMBL28074676 | 0.81 | — | — | |
| SCHEMBL3912026 | 0.81 | — | — | |
| SCHEMBL3910453 | 0.81 | — | — | |
| Water SCHEMBL27502571 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 108 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| US-10985013-B2 | Method and precursors for manufacturing 3D devices | VERSUM MATERIALS US, LLC (US) | 2021-04-20 | — | — | US | claimed |
| CN-105845549-B | Method and precursor for manufacturing 3D devices | 弗萨姆材料美国有限责任公司 | 2020-03-03 | — | — | CN | claimed |
| US-10354860-B2 | Method and precursors for manufacturing 3D devices | VERSUM MATERIALS US, LLC (US) | 2019-07-16 | — | — | US | claimed |
| US-20180047898-A1 | PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY | AIR PRODUCTS AND CHEMICALS, INC. | 2018-02-15 | — | — | US | claimed |
| CN-107636852-A | Method for depositing porous organosilicate glass films for use as resistive random access memories | 弗萨姆材料美国有限责任公司 | 2018-01-26 | — | — | CN | claimed |
| EP-2412011-B1 | CHEMICAL VAPOR DEPOSITION METHOD | TOKYO ELECTRON LTD (JP) | 2017-09-20 | — | — | EP | claimed |
| CN-105845549-A | Method and precursors for manufacturing 3D devices | 气体产品与化学公司 | 2016-08-10 | — | — | CN | claimed |
| US-20160225616-A1 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-08-04 | — | — | US | claimed |
| EP-3051001-A2 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-08-03 | — | — | EP | claimed |
| US-9212420-B2 | Chemical vapor deposition method | TOKYO ELECTRON LIMITED (JP) | 2015-12-15 | — | — | US | claimed |
| EP-1482070-B1 | MECHANICAL ENHANCER ADDITIVES FOR LOW DIELECTRIC FILMS | AIR PROD & CHEM (US) | 2015-11-11 | — | — | EP | claimed |
| US-8137764-B2 | organosilicate film formed by plasma-enhanced chemical vapor deposition from a first silicon-containing precursor that comprises from 3 to 4 Si O bonds per Si atom, from 0 to 1 of Si H, Si Br, and Si Cl bonds per Si atom and a second silicon-containing precursor comprises at least one Si C bond per Si | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-03-20 | — | — | US | claimed |
| US-20100247803-A1 | Chemical vapor deposition method | TOKYO ELECTRON LIMITED (JP) | 2010-09-30 | — | — | US | claimed |
| CN-101441415-A | Antireflective coatings | AIR PROD & CHEM (US) | 2009-05-27 | — | — | CN | claimed |
| US-20090096106-A1 | ANTIREFLECTIVE COATINGS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-04-16 | — | — | US | claimed |
| EP-2048700-A2 | Antireflective coatings | Air Products and Chemicals, Inc. (US) | 2009-04-15 | — | — | EP | claimed |
| US-20040241463-A1 | Mechanical enhancer additives for low dielectric films | VERSUM MATERIALS US, LLC | 2004-12-02 | — | — | US | claimed |
| EP-1482070-A1 | Mechanical enhancer additives for low dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-12-01 | — | — | EP | claimed |
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | disclosed |
| CN-116411261-A | Boron-containing compounds, compositions, and methods for depositing boron-containing films | 弗萨姆材料美国有限责任公司 | 2023-07-11 | — | — | CN | disclosed |
| US-11605535-B2 | Boron-containing compounds, compositions, and methods for the deposition of a boron containing films | VERSUM MATERIALS US, LLC (US) | 2023-03-14 | — | — | US | disclosed |
| US-11164739-B2 | Use of silicon structure former with organic substituted hardening additive compounds for dense OSG films | VERSUM MATERIALS US, LLC (US) | 2021-11-02 | — | — | US | disclosed |
| US-10985013-B2 | Method and precursors for manufacturing 3D devices | VERSUM MATERIALS US, LLC (US) | 2021-04-20 | — | — | US | disclosed |
| US-20200365401-A1 | Boron-Containing Compounds, Compositions, And Methods For The Deposition Of A Boron Containing Films | VERSUM MATERIALS US, LLC (US) | 2020-11-19 | — | — | US | disclosed |
| US-10763103-B2 | Boron-containing compounds, compositions, and methods for the deposition of a boron containing films | VERSUM MATERIALS US, LLC (US) | 2020-09-01 | — | — | US | disclosed |
| EP-3231892-B1 | MECHANICAL ENHANCEMENT OF DENSE AND POROUS ORGANOSILICATE MATERIALS BY UV EXPOSURE | VERSUM MAT US LLC (US) | 2020-08-05 | — | — | EP | disclosed |
| EP-3663301-A1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | Versum Materials US, LLC (US) | 2020-06-10 | — | — | EP | disclosed |
| CN-105845549-B | Method and precursor for manufacturing 3D devices | 弗萨姆材料美国有限责任公司 | 2020-03-03 | — | — | CN | disclosed |
| US-20190304775-A1 | Method and Precursors for Manufacturing 3D Devices | VERSUM MATERIALS US, LLC (US) | 2019-10-03 | — | — | US | disclosed |
| US-20190244810-A1 | Use of Silicon Structure Former with Organic Substituted Hardening Additive Compounds for Dense OSG Films | VERSUM MATERIALS US, LLC (US) | 2019-08-08 | — | — | US | disclosed |
| US-10354860-B2 | Method and precursors for manufacturing 3D devices | VERSUM MATERIALS US, LLC (US) | 2019-07-16 | — | — | US | disclosed |
| EP-3121310-B1 | METHOD FOR REMOVAL OF CARBON FROM AN ORGANOSILICATE MATERIAL | VERSUM MAT US LLC (US) | 2018-02-28 | — | — | EP | disclosed |
| US-20180047898-A1 | PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY | AIR PRODUCTS AND CHEMICALS, INC. | 2018-02-15 | — | — | US | disclosed |
| CN-107636852-A | Method for depositing porous organosilicate glass films for use as resistive random access memories | 弗萨姆材料美国有限责任公司 | 2018-01-26 | — | — | CN | disclosed |
| EP-2199428-B1 | Method for removal of carbon from an organosilicate material | VERSUM MAT US LLC (US) | 2018-01-24 | — | — | EP | disclosed |
| EP-3231892-A1 | MECHANICAL ENHANCEMENT OF DENSE AND POROUS ORGANOSILICATE MATERIALS BY UV EXPOSURE | Versum Materials US, LLC (US) | 2017-10-18 | — | — | EP | disclosed |
| EP-2412011-B1 | CHEMICAL VAPOR DEPOSITION METHOD | TOKYO ELECTRON LTD (JP) | 2017-09-20 | — | — | EP | disclosed |
| EP-3211121-A2 | METHOD FOR REMOVAL OF CARBON FROM AN ORGANOSILICATE MATERIAL | Air Products and Chemicals, Inc. (US) | 2017-08-30 | — | — | EP | disclosed |
| EP-1457583-B1 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | AIR PROD & CHEM (US) | 2017-05-31 | — | — | EP | disclosed |
| EP-1848032-B1 | Materials and methods of forming controlled voids in dielectric layers | AIR PROD & CHEM (US) | 2017-03-01 | — | — | EP | disclosed |
| EP-3121310-A1 | METHOD FOR REMOVAL OF CARBON FROM AN ORGANOSILICATE MATERIAL | Air Products and Chemicals, Inc. (US) | 2017-01-25 | — | — | EP | disclosed |
| EP-2657365-B1 | Method for removal of carbon from an organosilicate material | AIR PROD & CHEM (US) | 2017-01-18 | — | — | EP | disclosed |
| US-20160293410-A1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF A BORON CONTAINING FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-10-06 | — | — | US | disclosed |
| CN-105845549-A | Method and precursors for manufacturing 3D devices | 气体产品与化学公司 | 2016-08-10 | — | — | CN | disclosed |
| US-20160225616-A1 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-08-04 | — | — | US | disclosed |
| EP-3051001-A2 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-08-03 | — | — | EP | disclosed |
| US-9293361-B2 | Materials and methods of forming controlled void | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-03-22 | — | — | US | disclosed |
| US-9212420-B2 | Chemical vapor deposition method | TOKYO ELECTRON LIMITED (JP) | 2015-12-15 | — | — | US | disclosed |
| EP-1482070-B1 | MECHANICAL ENHANCER ADDITIVES FOR LOW DIELECTRIC FILMS | AIR PROD & CHEM (US) | 2015-11-11 | — | — | EP | disclosed |
| US-9061317-B2 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-06-23 | — | — | US | disclosed |
| US-8951342-B2 | Methods for using porogens for low k porous organosilica glass films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-02-10 | — | — | US | disclosed |
| US-20140363950-A1 | Materials and Methods of Forming Controlled Void | VERSUM MATERIALS US, LLC | 2014-12-11 | — | — | US | disclosed |
| US-8846522-B2 | Materials and methods of forming controlled void | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-09-30 | — | — | US | disclosed |
| US-8759563-B2 | Low-impurity organosilicon product as precursor for CVD | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-06-24 | — | — | US | disclosed |
| US-20130295334-A1 | Method for Removal of Carbon from an Organosilicate Material | VERSUM MATERIALS US, LLC | 2013-11-07 | — | — | US | disclosed |
| EP-2657365-A2 | Method for removal of carbon from an organosilicate material | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-30 | — | — | EP | disclosed |
| US-20130260575-A1 | SILICON PRECURSORS AND COMPOSITIONS COMPRISING SAME FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-03 | — | — | US | disclosed |
| CN-101621001-B | Mechanical enhancement of dense and porous organosilicate materials by uv exposure | AIR PROD & CHEM | 2013-09-25 | — | — | CN | disclosed |
| US-20130157435-A1 | Materials and Methods of Forming Controlled Void | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-06-20 | — | — | US | disclosed |
| US-20130095255-A1 | Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-04-18 | — | — | US | disclosed |
| US-8399349-B2 | Materials and methods of forming controlled void | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-03-19 | — | — | US | disclosed |
| US-20130060061-A1 | Low-Impurity Organosilicon Product as Precursor for CVD | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-03-07 | — | — | US | disclosed |
| US-8329933-B2 | Low-impurity organosilicon product as precursor for CVD | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-12-11 | — | — | US | disclosed |
| US-20120282415-A1 | Methods For Using Porogens For Low K Porous Organosilica Glass Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-11-08 | — | — | US | disclosed |
| US-8293001-B2 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-23 | — | — | US | disclosed |
| US-8137764-B2 | organosilicate film formed by plasma-enhanced chemical vapor deposition from a first silicon-containing precursor that comprises from 3 to 4 Si O bonds per Si atom, from 0 to 1 of Si H, Si Br, and Si Cl bonds per Si atom and a second silicon-containing precursor comprises at least one Si C bond per Si | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-03-20 | — | — | US | disclosed |
| US-20110295033-A1 | LOW-IMPURITY ORGANOSILICON PRODUCT AS PRECURSOR FOR CVD | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-12-01 | — | — | US | disclosed |
| US-20110143032-A1 | Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films With Low Dielectric Constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-16 | — | — | US | disclosed |
| US-7943195-B2 | Mixing of glass with hydrocarbons; chemical vapor deposition; mixing organosilane and/or organosiloxane precursors with porogens; neohexyl-1,3,5,7-tetramethylcyclo-tetrasiloxane | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-05-17 | — | — | US | disclosed |
| US-7932188-B2 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-04-26 | — | — | US | disclosed |
| EP-1354980-B1 | Method for forming a porous SiOCH layer. | AIR PROD & CHEM (US) | 2011-02-23 | — | — | EP | disclosed |
| US-7855123-B2 | Method of integrating an air gap structure with a substrate | TOKYO ELECTRON LIMITED (JP) | 2010-12-21 | — | — | US | disclosed |
| EP-2261390-A2 | Mechanical enhancer additives for low dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-12-15 | — | — | EP | disclosed |
| US-20100247803-A1 | Chemical vapor deposition method | TOKYO ELECTRON LIMITED (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100248443-A1 | Method of integrating an air gap structure with a substrate | TOKYO ELECTRON LIMITED (JP) | 2010-09-30 | — | — | US | disclosed |
| EP-2199428-A2 | Method for removal of carbon from an organosilicate material | Air Products and Chemicals, Inc. (US) | 2010-06-23 | — | — | EP | disclosed |
| US-20100151206-A1 | Method for Removal of Carbon From An Organosilicate Material | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-17 | — | — | US | disclosed |
| EP-1867653-B1 | Low-impurity organosilicon product as precursor for CVD | AIR PROD & CHEM (US) | 2010-04-14 | — | — | EP | disclosed |
| CN-101621001-A | Mechanical enhancement of dense and porous organosilicate materials by uv exposure | AIR PROD & CHEM | 2010-01-06 | — | — | CN | disclosed |
| EP-2116632-A2 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | Air Products and Chemicals, Inc. (US) | 2009-11-11 | — | — | EP | disclosed |
| CN-100543947-C | Mixture for depositing low dielectric constant organosilicate films | AIR PROD & CHEM (US) | 2009-09-23 | — | — | CN | disclosed |
| EP-1953168-B1 | Method of purifying organosilicon compositions used as precursors in chemical vapor deposition | AIR PROD & CHEM (US) | 2009-07-01 | — | — | EP | disclosed |
| CN-101441415-A | Antireflective coatings | AIR PROD & CHEM (US) | 2009-05-27 | — | — | CN | disclosed |
| US-20090096106-A1 | ANTIREFLECTIVE COATINGS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-04-16 | — | — | US | disclosed |
| EP-2048700-A2 | Antireflective coatings | Air Products and Chemicals, Inc. (US) | 2009-04-15 | — | — | EP | disclosed |
| US-20090054674-A1 | Mechanical Enhancement of Dense and Porous Organosilicate Materials by UV Exposure | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-02-26 | — | — | US | disclosed |
| US-7468290-B2 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-12-23 | — | — | US | disclosed |
| US-20080271640-A1 | Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-11-06 | — | — | US | disclosed |
| US-20080268177-A1 | Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-10-30 | — | — | US | disclosed |
| US-20080188679-A1 | Method Of Purifying Organosilicon Compositions Used As Precursors In Chemical Vapor Desposition | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-08-07 | — | — | US | disclosed |
| EP-1953168-A1 | Method of purifying organosilicon compositions used as precursors in chemical vapor deposition | Air Products and Chemicals, Inc. (US) | 2008-08-06 | — | — | EP | disclosed |
| US-7384471-B2 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-06-10 | — | — | US | disclosed |
| US-20080038934-A1 | MATERIALS AND METHODS OF FORMING CONTROLLED VOID | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-02-14 | — | — | US | disclosed |
| EP-1867653-A1 | Low-impurity organosilicon product as precursor for CVD | Air Products and Chemicals, Inc. (US) | 2007-12-19 | — | — | EP | disclosed |
| US-20070287849-A1 | Low-Impurity Organosilicon Product As Precursor For CVD | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2007-12-13 | — | — | US | disclosed |
| EP-1848032-A2 | Materials and methods of forming controlled voids in dielectric layers | Air Products and Chemicals, Inc. (US) | 2007-10-24 | — | — | EP | disclosed |
| US-7098149-B2 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-08-29 | — | — | US | disclosed |
| US-6846515-B2 | Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-01-25 | — | — | US | disclosed |
| US-20040241463-A1 | Mechanical enhancer additives for low dielectric films | VERSUM MATERIALS US, LLC | 2004-12-02 | — | — | US | disclosed |
| EP-1482070-A1 | Mechanical enhancer additives for low dielectric films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-12-01 | — | — | EP | disclosed |
| EP-1457583-A2 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-09-15 | — | — | EP | disclosed |
| US-20040175957-A1 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | VERSUM MATERIALS US, LLC | 2004-09-09 | — | — | US | disclosed |
| US-20040175501-A1 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | VERSUM MATERIALS US, LLC | 2004-09-09 | — | — | US | disclosed |
| CN-1527366-A | Mechanical property improvement of dense and porous organosilicate materials by ultraviolet radiation | �����Ʒ�뻯ѧ��˾ | 2004-09-08 | — | — | CN | disclosed |
| US-20030232137-A1 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | VERSUM MATERIALS US, LLC | 2003-12-18 | — | — | US | disclosed |
| US-20030198742-A1 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | VERSUM MATERIALS US, LLC | 2003-10-23 | — | — | US | disclosed |
| EP-1354980-A1 | Method for forming a porous SiOCH layer. | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2003-10-22 | — | — | EP | disclosed |
| EP-1354980-A1 | Method for forming a porous SiOCH layer. | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2003-10-22 | — | — | EP | disclosed |