SCHEMBL730808

SCHEMBL730808

C=C(C)C(=O)OCC(CCCCCCCC)OC(=O)C(=C)C

nearest known ligand 0.56

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.56
ALDH1A1 P00352 1/20 0.44
LMNA P02545 1/20 0.44
PRKCA P17252 4/20 0.42
PRKCE Q02156 1/20 0.41
PRKCQ Q04759 1/20 0.41
PRKCD Q05655 1/20 0.41
FAAH O00519 1/20 0.41
ZDHHC7 Q9NXF8 1/20 0.39
THRB P10828 1/20 0.38
ENPP2 Q13822 1/20 0.37
LPAR1 Q92633 1/20 0.37
LPAR3 Q9UBY5 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27370383 1.00 TSHR (0.56) TSHRALDH1A1LMNAPRKCAPRKCE
SCHEMBL730544 1.00 TSHR (0.56) TSHRALDH1A1LMNAPRKCAPRKCE
SCHEMBL27370412 1.00 TSHR (0.56) TSHRALDH1A1LMNAPRKCAPRKCE
SCHEMBL27370395 1.00 TSHR (0.56) TSHRALDH1A1LMNAPRKCAPRKCE
SCHEMBL22207427 1.00 TSHR (0.56) TSHRALDH1A1LMNAPRKCAPRKCE
SCHEMBL730445 0.94 TSHR (0.50) TSHRALDH1A1LMNAPRKCAPRKCE
SCHEMBL6679717 0.89 TSHR (0.55) TSHRLMNAFAAHZDHHC7
SCHEMBL2725427 0.89 TSHR (0.55) TSHRLMNAFAAHZDHHC7
SCHEMBL1702704 0.89 TSHR (0.55) TSHRLMNAFAAHZDHHC7
SCHEMBL478186 0.89 TSHR (0.55) TSHRLMNAFAAHZDHHC7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250155808-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN ZEON CORPORATION (JP) 2025-05-15 US disclosed
WO-2024143072-A1 COMPOSITION AND CURED PRODUCT 株式会社ADEKA 2024-07-04 WO disclosed
WO-2024070672-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2024-04-04 WO disclosed
WO-2023189969-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2023-10-05 WO disclosed
EP-3932906-B1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT ADEKA CORP (JP) 2023-07-12 EP disclosed
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product ADEKA CORPORATION (JP) 2023-06-06 US disclosed
CN-113544120-B Novel compound, composition containing same, self-repairing material, surface coating agent, paint, adhesive, battery material, and cured product 株式会社ADEKA 2023-05-02 CN disclosed
US-20220153698-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT ADEKA CORPORATION (JP) 2022-05-19 US disclosed
EP-3932906-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT ADEKA CORPORATION (JP) 2022-01-05 EP disclosed
CN-113544120-A Novel compound, composition containing same, and cured product 株式会社ADEKA 2021-10-22 CN disclosed
CN-102498146-A Polymer compositions and methods of making and using the same POLYMERIGHT INC 2012-06-13 CN disclosed
US-20120130040-A1 Polymer Compositions and Methods of Making and Using Same POLYMERIGHT, INC. (US) 2012-05-24 US disclosed
EP-2448990-A1 POLYMER COMPOSITIONS AND METHODS OF MAKING AND USING SAME Polymeright Inc. (US) 2012-05-09 EP disclosed
US-8138278-B2 Polymer compositions and methods of making and using same POLYMERIGHT, INC. (US) 2012-03-20 US disclosed
US-20110152492-A1 Polymer Compositions and Methods of Making and Using Same POLYMERIGHT, INC. (US) 2011-06-23 US disclosed
WO-2011008480-A1 POLYMER COMPOSITIONS AND METHODS OF MAKING AND USING SAME POLYMERIGHT, INC. (US) 2011-01-20 WO disclosed
US-7585932-B2 Polymer compositions and processes for making and using same CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2009-09-08 US disclosed
EP-1940917-A2 POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME Chevron Phillips Chemical Company LP (US) 2008-07-09 EP disclosed
US-20070055033-A1 POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME CHEVRON PHILLIPS CHEMICAL COMPANY, LP 2007-03-08 US disclosed
WO-2007021960-A2 POLYMER COMPOSITIONS AND PROCESSES FOR MAKING AND USING SAME CHEVRON PHILLIPS CHEMICAL COMPANY LP (US) 2007-02-22 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product H1-0, H1-10, RAD51 TSHR 4534/4885ALDH1A1 323/4885LMNA 2828/4885
US-20220153698-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT H1-0, H1-10, RAD51 TSHR 4592/4885ALDH1A1 367/4885LMNA 3038/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.