⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7723431 | 0.85 | — | — | |
| SCHEMBL9750871 | 0.71 | — | — | |
| SCHEMBL714797 | 0.70 | — | — | |
| SCHEMBL7923511 | 0.70 | — | — | |
| SCHEMBL9224200 | 0.68 | — | — | |
| SCHEMBL10390106 | 0.68 | — | — | |
| SCHEMBL10390244 | 0.68 | — | — | |
| SCHEMBL2426984 | 0.68 | — | — | |
| SCHEMBL10390027 | 0.68 | — | — | |
| Hydrochloric Acid SCHEMBL7918834 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8962893-B2 | Organometallic compound purification | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-02-24 | — | — | US | claimed |
| EP-0806495-B1 | Metal-organic chemical vapor-phase deposition process | SONY CORP (JP) | 2002-09-11 | — | — | EP | claimed |
| EP-0656431-B1 | Metal-organic chemical vapor-phase deposition process | SONY CORP (JP) | 1999-07-21 | — | — | EP | claimed |
| EP-0806495-A2 | Metal-organic chemical vapor-phase deposition process | SONY CORPORATION (JP) | 1997-11-12 | — | — | EP | claimed |
| US-5433170-A | Metal-organic chemical vapor-phase deposition process for fabricating light-emitting devices | SONY CORPORATION (JP) | 1995-07-18 | — | — | US | claimed |
| EP-0656431-A2 | Metal-organic chemical vapor-phase deposition process | SONY CORPORATION (JP) | 1995-06-07 | — | — | EP | claimed |
| JP-7074108-A | — | — | None | — | — | JP | disclosed |
| EP-2570512-B1 | Thin film processing equipment and the processing method thereof | KERN ENERGY ENTPR CO LTD (TW) | 2016-05-04 | — | — | EP | disclosed |
| US-8962893-B2 | Organometallic compound purification | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2015-02-24 | — | — | US | disclosed |
| US-20140061956-A1 | ORGANOMETALLIC COMPOUND PURIFICATION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-03-06 | — | — | US | disclosed |
| US-8409893-B2 | Semiconductor light-emitting element, fabrication method thereof, convex part formed on backing, and convex part formation method for backing | SONY CORPORATION (JP) | 2013-04-02 | — | — | US | disclosed |
| US-20130071567-A1 | Thin film processing equipment and the processing method thereof | KERN ENERGY ENTERPRISE CO., LTD. (TW) | 2013-03-21 | — | — | US | disclosed |
| US-20130072000-A1 | Thin film processing equipment and the processing method thereof | YOSHIMURA, TOSHIAKU (JP) | 2013-03-21 | — | — | US | disclosed |
| EP-0806495-A2 | Metal-organic chemical vapor-phase deposition process | SONY CORPORATION (JP) | 1997-11-12 | — | — | EP | disclosed |
| US-5433170-A | Metal-organic chemical vapor-phase deposition process for fabricating light-emitting devices | SONY CORPORATION (JP) | 1995-07-18 | — | — | US | disclosed |
| EP-0656431-A2 | Metal-organic chemical vapor-phase deposition process | SONY CORPORATION (JP) | 1995-06-07 | — | — | EP | disclosed |
| JP-H0774108-A | VAPOR PHASE EPITAXY AND MAGNESIUM MATERIAL THEREFOR | MITSUBISHI CABLE IND LTD | 1995-03-17 | — | — | JP | disclosed |
| US-5079184-A | METHOD OF MANUFACTURING III-IV GROUP COMPOUND SEMICONDUCTOR DEVICE | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-01-07 | — | — | US | disclosed |
| US-4927670-A | ALKYLCYCLOPENTADIENYL METAL COMPOUND | GEORGIA TECH RESEARCH CORPORATION (US) | 1990-05-22 | — | — | US | disclosed |
| US-4915988-A | Chemical vapor deposition of group IIA metals and precursors therefor | GEORGIA TECH RESEARCH CORPORATION (US) | 1990-04-10 | — | — | US | disclosed |