⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13767991 | 1.00 | — | — | |
| SCHEMBL19256532 | 1.00 | — | — | |
| SCHEMBL26028397 | 0.84 | TSHR (0.46) | — | |
| SCHEMBL6681924 | 0.79 | TSHR (0.35) | — | |
| SCHEMBL6682759 | 0.79 | TSHR (0.35) | — | |
| SCHEMBL12335659 | 0.79 | TSHR (0.35) | — | |
| SCHEMBL5698423 | 0.79 | — | — | |
| SCHEMBL22413533 | 0.77 | — | — | |
| SCHEMBL25641651 | 0.77 | — | — | |
| SCHEMBL18324064 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5275669-A | Degreasing glass, metal, plastic and fiber surfaces | ALLIEDSIGNAL INC. (US) | 1994-01-04 | — | — | US | claimed |
| US-11916195-B2 | Electrolyte solution, electrochemical device, lithium ion secondary battery, and module | DAIKIN INDUSTRIES, LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20230387465-A1 | COMPOUND, COMPOSITION, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY AND MODULE | DAIKIN INDUSTRIES, LTD. (JP) | 2023-11-30 | — | — | US | disclosed |
| US-20230250046-A1 | FLUORINATED CARBOXYLIC ACID SALT COMPOUND | DAIKIN INDUSTRIES, LTD. (JP) | 2023-08-10 | — | — | US | disclosed |
| US-20230220128-A1 | FLUORINE-CONTAINING POLYMER AND PRODUCTION METHOD THEREOF | DAIKIN INDUSTRIES, LTD. (JP) | 2023-07-13 | — | — | US | disclosed |
| US-11664534-B2 | Electrolytic solution, electrochemical device, lithium ion secondary battery, and module | DAIKIN INDUSTRIES, LTD. (JP) | 2023-05-30 | — | — | US | disclosed |
| US-20230129817-A1 | ELECTROLYTE SOLUTION, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY AND MODULE | DAIKIN INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-11239434-B2 | Organic electroluminescent materials and devices | UNIVERSAL DISPLAY CORPORATION (US) | 2022-02-01 | — | — | US | disclosed |
| EP-3667804-B1 | ELECTROLYTE SOLUTION CONTAINING UNSATURATED CYCLIC CARBONATES, ELECTROCHEMICAL DEVICE AND LITHIUM-ION SECONDARY BATTERY COMPRISING THE SAME | DAIKIN IND LTD (JP) | 2021-04-21 | — | — | EP | disclosed |
| EP-3750884-A1 | NOVEL FLUORINATED UNSATURATED CYCLIC CARBONATE AND PROCESS FOR PRODUCING THE SAME | DAIKIN INDUSTRIES, LTD. (JP) | 2020-12-16 | — | — | EP | disclosed |
| US-8007679-B2 | Electrolytic solution | DAIKIN INDUSTRIES, LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| US-7998654-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2011-08-16 | — | — | US | disclosed |
| US-20100040975-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20080292989-A1 | POSITIVE WORKING PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-11-27 | — | — | US | disclosed |
| US-7455952-B2 | Patterning process and resist overcoat material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-11-25 | — | — | US | disclosed |
| US-20080248425-A1 | Adjust solubility of alkali developer using acid; acid generator; actinic radiation | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20070122736-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. | 2007-05-31 | — | — | US | disclosed |
| EP-1193309-B1 | Solvent blend for use in high purity precursor removal | AIR PROD & CHEM (US) | 2004-11-03 | — | — | EP | disclosed |
| EP-1193309-A1 | Solvent blend for use in high purity precursor removal | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2002-04-03 | — | — | EP | disclosed |