Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP4 | P27487 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | AURKA | O14965 | 1/20 | 0.39 |
| ▸ | AURKB | Q96GD4 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | IDO1 | P14902 | 3/20 | 0.36 |
| ▸ | PNMT | P11086 | 1/20 | 0.36 |
| ▸ | CSNK2A2 | P19784 | 1/20 | 0.34 |
| ▸ | CSNK2B | P67870 | 1/20 | 0.34 |
| ▸ | CSNK2A1 | P68400 | 1/20 | 0.34 |
| ▸ | CSNK2A3 | Q8NEV1 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.33 |
| ▸ | DNMT3L | Q9UJW3 | 1/20 | 0.33 |
| ▸ | DNMT3A | Q9Y6K1 | 1/20 | 0.33 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.33 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.33 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.33 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10896807 | 0.97 | DPP4 (0.44) | DPP4ALDH1A1TSHRAURKAAURKB | |
| SCHEMBL19002938 | 0.89 | DPP4 (0.40) | DPP4ALDH1A1TSHRAURKAAURKB | |
| SCHEMBL1538745 | 0.87 | DPP4 (0.39) | DPP4ALDH1A1TSHRAURKAAURKB | |
| SCHEMBL9456872 | 0.86 | DPP4 (0.50) | DPP4ALDH1A1TSHRAURKAAURKB | |
| SCHEMBL8858813 | 0.85 | HSPA5 (0.46) | DPP4ALDH1A1TSHRAURKAAURKB | |
| SCHEMBL29265422 | 0.85 | DPP4 (0.50) | DPP4ALDH1A1TSHRKMT2APDCD1 | |
| SCHEMBL8108088 | 0.85 | TAAR1 (0.41) | DPP4ALDH1A1TSHRKMT2AIDO1 | |
| SCHEMBL31179899 | 0.84 | DPP4 (0.48) | DPP4ALDH1A1TSHRAURKAAURKB | |
| SCHEMBL83911 | 0.84 | DPP4 (0.60) | DPP4ALDH1A1TSHRKMT2APDCD1 | |
| SCHEMBL150237 | 0.83 | TSHR (0.50) | DPP4ALDH1A1TSHRAURKAAURKB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9447238-B2 | Polyphenylene oxide resin, method of preparing polyphenylene oxide resin, polyphenylene oxide prepolymer and resin composition | ELITE ELECTRONIC MATERIAL (KUNSHAN) CO., LTD. (CN) | 2016-09-20 | — | — | US | claimed |
| US-20160185904-A1 | POLYPHENYLENE OXIDE RESIN, METHOD OF PREPARING POLYPHENYLENE OXIDE RESIN, POLYPHENYLENE OXIDE PREPOLYMER AND RESIN COMPOSITION | ELITE ELECTRONIC MATERIAL (KUNSHAN) CO., LTD. (CN) | 2016-06-30 | — | — | US | claimed |
| US-12378354-B2 | Active ester resin, method for producing thereof, epoxy resin composition, cured product thereof, prepreg, laminated board, and material for circuit substrate | NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) | 2025-08-05 | — | — | US | disclosed |
| EP-4585661-A1 | ADHESIVE COMPOSITION FOR SEMICONDUCTOR PACKAGE | LG CHEM, LTD. (KR) | 2025-07-16 | — | — | EP | disclosed |
| WO-2025018840-A1 | ADHESIVE COMPOSITION FOR SEMICONDUCTOR PACKAGE | 주식회사 엘지화학 | 2025-01-23 | — | — | WO | disclosed |
| US-20240329525-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-10-03 | — | — | US | disclosed |
| US-20240270899-A1 | POLYESTER RESIN | AJINOMOTO CO., INC. (JP) | 2024-08-15 | — | — | US | disclosed |
| EP-4410860-A1 | POLYESTER RESIN | AJINOMOTO CO., INC. (JP) | 2024-08-07 | — | — | EP | disclosed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11993731-B2 | Adhesive composition for semiconductor circuit connection and adhesive film containing the same | LG CHEM, LTD. (KR) | 2024-05-28 | — | — | US | disclosed |
| WO-2024071129-A1 | ACTIVE ESTER RESIN, EPOXY RESIN COMPOSITION AND CURED PRODUCT THEREOF, PREPREG, LAMINATED BOARD, AND BUILD-UP FILM | 日鉄ケミカル＆マテリアル株式会社 | 2024-04-04 | — | — | WO | disclosed |
| WO-1999064044-A1 | NOVEL THERAPEUTIC AGENTS THAT MODULATE 5-HT RECEPTORS | ADVANCED MEDICINE, INC. (US) | 1999-12-16 | — | — | WO | disclosed |
| EP-0514338-B1 | Mixtures of sprioheptadiene compounds | CIBA GEIGY AG (CH) | 1996-03-27 | — | — | EP | disclosed |
| EP-0514338-A1 | Mixtures of sprioheptadiene compounds | CIBA-GEIGY AG (CH) | 1992-11-19 | — | — | EP | disclosed |
| US-4987206-A | IMPROVED CHEMICAL RESISTANCE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-01-22 | — | — | US | disclosed |
| US-4879416-A | Preparation of bidentate ligands | EASTMAN KODAK COMPANY (US) | 1989-11-07 | — | — | US | disclosed |
| US-4564705-A | POLYAMIDE, POLYUREA AND POLYURETHANE MONOMERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1986-01-14 | — | — | US | disclosed |
| US-4451642-A | Bis(aminoneopentyl) aromatics and polyamides derived therefrom | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-05-29 | — | — | US | disclosed |
| US-4202838-A | Sulphonated condensation products | CIBA-GEIGY CORPORATION (US) | 1980-05-13 | — | — | US | disclosed |
| US-4130579-A | Bis(2-methyl-2-cyanopropyl) aromatics | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1978-12-19 | — | — | US | disclosed |