⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL11208195 | 0.95 | — | — | |
| Ammonia Solution, Strong SCHEMBL9185285 | 0.95 | — | — | |
| SCHEMBL17221 | 0.94 | — | — | |
| SCHEMBL8144244 | 0.94 | — | — | |
| SCHEMBL9202049 | 0.94 | — | — | |
| SCHEMBL3113700 | 0.89 | — | — | |
| SCHEMBL18050339 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL786322 | 0.89 | — | — | |
| SCHEMBL5005487 | 0.89 | — | — | |
| SCHEMBL9561672 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1409766-A1 | SYSTEMS AND METHODS FOR DELIVERING AN ULTRAPURE CHEMICAL | L'Air Liquide S. A. à Directoire et Conseil de Surveillance pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2004-04-21 | — | — | EP | claimed |
| WO-2003012163-A2 | INTEGRAL BLOCKS, CHEMICAL DELIVERY SYSTEMS AND METHODS FOR DELIVERING AN ULTRAPURE CHEMICAL | L'AIR LIQUIDE-SOCIETE ANONYME A DIRECTOIRE ET CONSEIL DE SURVEILLANCE POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (US) | 2003-02-13 | — | — | WO | claimed |
| US-20030012709-A1 | Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical | AMERICAN AIR LIQUIDE, INC. | 2003-01-16 | — | — | US | claimed |
| US-6174563-B1 | FORMING AN INTEGRATED CIRCUIT WHICH INCLUDES A METAL FILM LAYER FOR WIRING | NEC CORPORATION (JP) | 2001-01-16 | — | — | US | claimed |
| US-6141476-A | Hollow waveguide for ultraviolet light and making the same | MATSUURA YUJI (JP) | 2000-10-31 | — | — | US | claimed |
| JP-5175131-A | — | — | None | — | — | JP | disclosed |
| EP-4363631-A1 | CONCENTRATION SENSOR FOR PRECURSOR DELIVERY SYSTEM | Applied Materials, Inc. (US) | 2024-05-08 | — | — | EP | disclosed |
| US-20240019410-A1 | CONCENTRATION SENSOR FOR PRECURSOR DELIVERY SYSTEM | APPLIED MATERIALS, INC. | 2024-01-18 | — | — | US | disclosed |
| US-11866547-B2 | Method for producing functionalized polyesters | HENKEL AG & CO. KGAA (DE) | 2024-01-09 | — | — | US | disclosed |
| US-11808746-B2 | Concentration sensor for precursor delivery system | APPLIED MATERIALS, INC. (US) | 2023-11-07 | — | — | US | disclosed |
| WO-2023278474-A1 | CONCENTRATION SENSOR FOR PRECURSOR DELIVERY SYSTEM | APPLIED MATERIALS, INC. (US) | 2023-01-05 | — | — | WO | disclosed |
| US-20230003704-A1 | CONCENTRATION SENSOR FOR PRECURSOR DELIVERY SYSTEM | APPLIED MATERIALS, INC. | 2023-01-05 | — | — | US | disclosed |
| US-5980637-A | System for depositing a material on a substrate using light energy | STEAG RTP SYSTEMS, INC. (US) | 1999-11-09 | — | — | US | disclosed |
| US-5820942-A | ATOMIZING A FLUOROPOLYMER SOLUTION THAN CONTACTING WITH LIGHT ENERGY FORMING A FILM ADHERING TO A SUBSTRATE | AG ASSOCIATES (US) | 1998-10-13 | — | — | US | disclosed |
| US-5545591-A | Method for forming an aluminum film used as an interconnect in a semiconductor device | NEC CORPORATION (JP) | 1996-08-13 | — | — | US | disclosed |
| US-5545591-A | Method for forming an aluminum film used as an interconnect in a semiconductor device | NEC CORPORATION (JP) | 1996-08-13 | — | — | US | disclosed |
| US-5455367-A | Method for the synthesis of silanes or organosilicon hydrides by the reduction of the corresponding silicon halides or organosilicon halides | TH. GOLDSCHMIDT AG (DE) | 1995-10-03 | — | — | US | disclosed |
| US-5273775-A | Depositing aluminum onto a patterned copper/silicon/silicon dioxide substrate using a vapor of an aminealane compound | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1993-12-28 | — | — | US | disclosed |
| EP-0566040-A2 | Process for selectively depositing copper aluminum alloy onto a substrate | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1993-10-20 | — | — | EP | disclosed |
| JP-H05175131-A | FORMATION OF III-V COMPOUND SEMICONDUCTOR LAYER | NIPPON TELEGR & TELEPH CORP <NTT> | 1993-07-13 | — | — | JP | disclosed |