SCHEMBL7370091

SCHEMBL7370091

O=C=C1C=CC=C2C(=O)NC(=O)C12

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL27673319 0.98
SCHEMBL2361687 0.77 HAO1 (0.30)
Hydrochloric Acid SCHEMBL5089743 0.76
Hydrochloric Acid SCHEMBL11524214 0.74
SCHEMBL28948951 0.74
SCHEMBL361250 0.74
SCHEMBL28948957 0.71
Chloroform SCHEMBL7534512 0.69
Methylene Chloride SCHEMBL27480080 0.69
SCHEMBL30426195 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-8062896-A None JP disclosed
CN-106660910-A OXIDATION REACTOR AND PROCESS FOR PRODUCING OXIDE 公立大学法人大阪府立大学 2017-05-10 CN disclosed
CN-106573858-A Oxidation reactor and production method for oxide 株式会社大赛璐 2017-04-19 CN disclosed
CN-103459400-B Mi Zuo Bing oxazine compounds or its salt TAIHO PHARMACEUTICAL CO.,LTD. (JP) 2016-05-18 CN disclosed
CN-101495919-B Positive photosensitive resin composition, method for preparing cured relief pattern, semiconductor device ASAHI KASEI E MATERIALS CORP 2015-05-06 CN disclosed
CN-102047178-B Photosensitive resin composition ASAHI KASEI E MATERIALS CORP 2014-05-28 CN disclosed
CN-102047179-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device ASAHI KASEI E MATERIALS CORP 2014-02-26 CN disclosed
CN-102047181-B Photosensitive resin composition ASAHI KASEI E MATERIALS CORP 2013-01-23 CN disclosed
CN-101273303-B Positive photosensitive resin composition ASAHI KASEI EMD CORP 2011-07-06 CN disclosed
CN-102047181-A Photosensitive resin composition ASAHI KASEI E MATERIALS CORP 2011-05-04 CN disclosed
US-4399049-A PARTICLES EXTRUDED WITH ETHOXYLATED NONIONIC SURFACTANT; STORAGE STABILITY; RABID DISPERSION; LAUNDERING THE PROCTER & GAMBLE COMPANY (US) 1983-08-16 US disclosed
EP-0063017-A1 Detergent compositions THE PROCTER &amp; GAMBLE COMPANY (US) 1982-10-20 EP disclosed
EP-0062523-A2 Detergent additive compositions and preparations and use thereof in detergent compositions THE PROCTER &amp; GAMBLE COMPANY (US) 1982-10-13 EP disclosed
EP-0051987-A1 Bleach activator compositions, preparation thereof and use in granular detergent compositions THE PROCTER &amp; GAMBLE COMPANY (US) 1982-05-19 EP disclosed
US-4321157-A SILICA OR SILICATE, ORGANIC PEROXY ACID BLEACH PRECURSOR, ALIPHATIC ALCOHOL-ALKYLENE OXIDE CONDENSATE NONIONIC SURFACTANT THE PROCTER & GAMBLE COMPANY (US) 1982-03-23 US disclosed
EP-0028432-A1 Granular laundry compositions THE PROCTER &amp; GAMBLE COMPANY (US) 1981-05-13 EP disclosed
US-4264466-A LAUNDRY DETERGENTS THE PROCTER & GAMBLE COMPANY (US) 1981-04-28 US disclosed
US-4248928-A TETRAACETYL AKYLENEDIAMINES OR TETRAACETYL GLYCOURIL PEROXY BLEACH PRECURSOR THE PROCTER & GAMBLE COMPANY (US) 1981-02-03 US disclosed
US-4179390-A Laundry additive product THE PROCTER & GAMBLE COMPANY (US) 1979-12-18 US disclosed
US-3982891-A Bleaching and detergent compositions having imide activator and peroxygen bleach COLGATE-PALMOLIVE COMPANY (US) 1976-09-28 US disclosed