Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.54 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.54 |
| ▸ | PKM | P14618 | 1/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.54 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.54 |
| ▸ | PRKCA | P17252 | 2/20 | 0.49 |
| ▸ | PRKCD | Q05655 | 2/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.41 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.40 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.40 |
| ▸ | GABBR1 | Q9UBS5 | 1/20 | 0.40 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.38 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18006556 | 0.93 | CYP2D6 (0.51) | CYP1A2CYP2D6PKMSMN1; SMN2NPSR1 | |
| SCHEMBL2705027 | 0.84 | CYP1A2 (0.56) | CYP1A2CYP2D6PKMSMN1; SMN2NPSR1 | |
| SCHEMBL2705028 | 0.84 | CYP1A2 (0.56) | CYP1A2CYP2D6PKMSMN1; SMN2NPSR1 | |
| SCHEMBL8103307 | 0.84 | CYP1A2 (0.56) | CYP1A2CYP2D6PKMSMN1; SMN2NPSR1 | |
| SCHEMBL8089944 | 0.81 | CYP1A2 (0.83) | CYP1A2CYP2D6PKMSMN1; SMN2NPSR1 | |
| SCHEMBL7775772 | 0.81 | CYP1A2 (0.83) | CYP1A2CYP2D6PKMSMN1; SMN2NPSR1 | |
| SCHEMBL742603 | 0.81 | CYP1A2 (0.56) | CYP1A2CYP2D6PKMSMN1; SMN2NPSR1 | |
| SCHEMBL23303256 | 0.80 | CYP1A2 (0.51) | CYP1A2CYP2D6PKMSMN1; SMN2NPSR1 | |
| Carbamic Acid SCHEMBL8392185 | 0.80 | CYP1A2 (0.60) | CYP1A2CYP2D6PKMSMN1; SMN2NPSR1 | |
| SCHEMBL7679725 | 0.80 | CYP1A2 (0.51) | CYP1A2CYP2D6PKMSMN1; SMN2NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107210197-B | Hybrid topography and chemical pre-patterning for directed self-assembly of block copolymers | 国际商业机器公司 | 2020-06-19 | — | — | CN | disclosed |
| US-10600680-B2 | Chemoepitaxy etch trim using a self aligned hard mask for metal line to via | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2020-03-24 | — | — | US | disclosed |
| US-10256139-B2 | Chemoepitaxy etch trim using a self aligned hard mask for metal line to via | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-04-09 | — | — | US | disclosed |
| US-20190043754-A1 | CHEMOEPITAXY ETCH TRIM USING A SELF ALIGNED HARD MASK FOR METAL LINE TO VIA | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2019-02-07 | — | — | US | disclosed |
| US-10118989-B2 | Methods of forming block polymers for directed self-assembly | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-11-06 | — | — | US | disclosed |
| US-10066040-B2 | Additives for orientation control of block copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-09-04 | — | — | US | disclosed |
| US-10059820-B2 | Hybrid topographical and chemical pre-patterns for directed self-assembly of block copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-08-28 | — | — | US | disclosed |
| US-10040879-B2 | Fluoro-alcohol additives for orientation control of block copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-08-07 | — | — | US | disclosed |
| US-9982097-B2 | Thin film self assembly of topcoat-free silicon-containing diblock copolymers | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-05-29 | — | — | US | disclosed |
| US-9879152-B2 | Block copolymers for directed self-assembly applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-01-30 | — | — | US | disclosed |
| US-8652762-B2 | Organic graded spin on BARC compositions for high NA lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-02-18 | — | — | US | disclosed |
| US-8623458-B2 | Methods of directed self-assembly, and layered structures formed therefrom | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-01-07 | — | — | US | disclosed |
| US-20120205787-A1 | ORGANIC GRADED SPIN ON BARC COMPOSITIONS FOR HIGH NA LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-08-16 | — | — | US | disclosed |
| US-8137874-B2 | Organic graded spin on BARC compositions for high NA lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-20 | — | — | US | disclosed |
| WO-2011080016-A2 | METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THEREFROM | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-07-07 | — | — | WO | disclosed |
| US-20110147983-A1 | METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THEREFROM | GLOBALFOUNDRIES U.S. INC. | 2011-06-23 | — | — | US | disclosed |
| US-20110147985-A1 | METHODS OF DIRECTED SELF-ASSEMBLY AND LAYERED STRUCTURES FORMED THEREFROM | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2011-06-23 | — | — | US | disclosed |
| US-20110147984-A1 | METHODS OF DIRECTED SELF-ASSEMBLY, AND LAYERED STRUCTURES FORMED THEREFROM | GLOBALFOUNDRIES U.S. INC. | 2011-06-23 | — | — | US | disclosed |
| WO-2011073013-A1 | METHODS OF DIRECTED SELF-ASSEMBLY WITH 193 - NM IMMERSION LITHOGRAPHY AND LAYERED STRUCTURES FORMED THEREFROM | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-06-23 | — | — | WO | disclosed |
| US-20090186294-A1 | ORGANIC GRADED SPIN ON BARC COMPOSITIONS FOR HIGH NA LITHOGRAPHY | IBM (US) | 2009-07-23 | — | — | US | disclosed |