⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethyne SCHEMBL432671 | 0.93 | — | — | |
| SCHEMBL8769453 | 0.74 | — | — | |
| SCHEMBL9489550 | 0.72 | — | — | |
| SCHEMBL8770072 | 0.72 | — | — | |
| SCHEMBL50067 | 0.71 | — | — | |
| SCHEMBL19384216 | 0.70 | — | — | |
| SCHEMBL8524493 | 0.69 | — | — | |
| SCHEMBL3904853 | 0.68 | — | — | |
| SCHEMBL8991830 | 0.68 | — | — | |
| SCHEMBL1550299 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 615 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240415002-A1 | MATERIALS FOR FORMING A NUCLEATION-INHIBITING COATING AND DEVICES INCORPORATING SAME | OTI LUMIONICS, INC. (CA) | 2024-12-12 | — | — | US | claimed |
| US-12069938-B2 | Materials for forming a nucleation-inhibiting coating and devices incorporating same | OTI LUMIONICS INC. (CA) | 2024-08-20 | — | — | US | claimed |
| US-20240117101-A1 | COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, COMPOSITION FOR OPTICAL MEMBER FORMATION, RESIN FOR UNDERLAYER FILM FORMATION, RESIST RESIN, RADIATION-SENSITIVE RESIN, AND RESIN FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-11 | — | — | US | claimed |
| US-20230324801-A1 | UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM, AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-10-12 | — | — | US | claimed |
| WO-2023072035-A1 | ADSORBENT FOR TRIMETHYLBENZENE COMPOUND AND PREPARATION METHOD THEREFOR, AND SEPARATION METHOD AND SEPARATION DEVICE FOR TRIMETHYLBENZENE COMPOUND | 中国石油化工股份有限公司 | 2023-05-04 | — | — | WO | claimed |
| US-20220260910-A1 | UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-08-18 | — | — | US | claimed |
| US-20220221619-A1 | MATERIALS FOR FORMING A NUCLEATION-INHIBITING COATING AND DEVICES INCORPORATING SAME | OTI LUMIONICS INC. (CA) | 2022-07-14 | — | — | US | claimed |
| EP-3789376-B1 | DIALKOXYALKADIENYNE COMPOUND AND A PROCESS FOR PREPARING THE SAME AND A PROCESS FOR PREPARING A DIENYNAL COMPOUND | SHINETSU CHEMICAL CO (JP) | 2022-03-23 | — | — | EP | claimed |
| WO-2022034831-A1 | COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM, AND PATTERN FORMING METHOD | 三菱瓦斯化学株式会社 | 2022-02-17 | — | — | WO | claimed |
| WO-2020241576-A1 | COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD | 三菱瓦斯化学株式会社 | 2020-12-03 | — | — | WO | claimed |
| US-10011489-B2 | Method of producing carbon nanostructures, and carbon nanotubes | ZEON CORPORATION (JP) | 2018-07-03 | — | — | US | claimed |
| US-8999524-B2 | Organic light-emitting device | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-04-07 | — | — | US | claimed |
| US-20110266531-A1 | ORGANIC LIGHT-EMITTING DEVICE | SAMSUNG MOBILE DISPLAY CO., LTD. (KR) | 2011-11-03 | — | — | US | claimed |
| WO-2009005839-A2 | COMPOUNDS AND METHODS OF USE | THE GOVERNMENT OF THE U.S.A. AS REPRESENTED BY THE SECRETARY OF THE DEPT. OF HEALTH & HUMAN SERVICE (US) | 2009-01-08 | — | — | WO | claimed |
| US-6713634-B2 | SEROTONIN RECEPTOR ANTAGONIST | DAIICHI SUNTORY PHARMA CO., LTD. (JP) | 2004-03-30 | — | — | US | claimed |
| WO-2004015171-A2 | MAGNETICALLY-ENHANCED ELECTROLYTIC CELLS FOR GENERATING CHLOR-ALKALI AND METHODS RELATED THERETO | SAINT LOUIS UNIVERSITY (US) | 2004-02-19 | — | — | WO | claimed |
| EP-0688444-B1 | POLYMERS EXHIBITING NONLINEAR OPTICAL PROPERTIES | ALLIED SIGNAL INC (US) | 1998-05-13 | — | — | EP | claimed |
| US-5670603-A | POLYESTER,-ETHERS, AMIDES, URETHANES,-EPOXIDES,-IMIDES, AND CARBONATES BASED ON MONOMERS OF 9,9-BIS/SUBSTITUTED PHENYLFLUORENE COMPOUNDS HAVING ELECTRON WITHDRAWING AND DONATING GROUPS; HEAT RESISTANCE; THIN FILMS | ALLIEDSIGNAL INC. (US) | 1997-09-23 | — | — | US | claimed |
| EP-0688444-A1 | POLYMERS EXHIBITING NONLINEAR OPTICAL PROPERTIES | AlliedSignal Inc. (US) | 1995-12-27 | — | — | EP | claimed |
| WO-1994020881-A1 | POLYMERS EXHIBITING NONLINEAR OPTICAL PROPERTIES | ALLIEDSIGNAL INC. (US) | 1994-09-15 | — | — | WO | claimed |