Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 6/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | FUCA1 | P04066 | 1/20 | 0.33 |
| ▸ | APLNR | P35414 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.32 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.32 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | SAT1 | P21673 | 1/20 | 0.31 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.31 |
| ▸ | BRD4 | O60885 | 1/20 | 0.30 |
| ▸ | NOS3 | P29474 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11227203 | 1.00 | ESR1 (0.38) | ESR1ESR2CYP3A4CYP2C9POLB | |
| SCHEMBL15473312 | 1.00 | ESR1 (0.38) | ESR1ESR2CYP3A4CYP2C9POLB | |
| SCHEMBL9648182 | 0.92 | ESR1 (0.34) | ESR1ESR2CYP3A4CYP2C9POLB | |
| SCHEMBL9406384 | 0.92 | ESR1 (0.34) | ESR1ESR2CYP3A4CYP2C9POLB | |
| SCHEMBL9406455 | 0.92 | ESR1 (0.34) | ESR1ESR2CYP3A4CYP2C9POLB | |
| SCHEMBL9647056 | 0.92 | ESR1 (0.34) | ESR1ESR2CYP3A4CYP2C9POLB | |
| SCHEMBL9647052 | 0.92 | ESR1 (0.34) | ESR1ESR2CYP3A4CYP2C9POLB | |
| SCHEMBL9648170 | 0.92 | ESR1 (0.34) | ESR1ESR2CYP3A4CYP2C9POLB | |
| SCHEMBL14277148 | 0.92 | ESR1 (0.42) | ESR1ESR2CYP3A4CYP2C9POLB | |
| Acetic Acid SCHEMBL1058296 | 0.87 | POLB (0.34) | ESR1ESR2CYP3A4CYP2C9POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1228 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11860540-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-02 | — | — | US | disclosed |
| EP-3838903-B1 | PYRROLO[2,3-D]PYRIMIDINE DERIVATIVE AS JANUS KINASE INHIBITOR | INCYTE HOLDINGS CORP (US) | 2023-11-22 | — | — | EP | disclosed |
| US-20230350296-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230323025-A1 | ALIPHATIC COPOLYCARBONATE AND PREPARATION METHOD THEREOF | CHENGDU ORGANIC CHEMISTRY CO., LTD., CHINESE ACADEMY OF SCIENCES (CN) | 2023-10-12 | — | — | US | disclosed |
| US-20230323022-A1 | POLYESTER AND MOLDED ARTICLE | CHANG CHUN PLASTICS CO., LTD. (TW) | 2023-10-12 | — | — | US | disclosed |
| US-20070009832-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-11 | — | — | US | disclosed |
| EP-1741705-A1 | Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-01-10 | — | — | EP | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| WO-2005012312-A1 | NOVEL CYANO THIAZOLIDES, METHODS FOR THE PRODUCTION THEREOF, AND USE THEREOF AS A MEDICAMENT | SANOFI-AVENTIS DEUTSCHLAND GMBH (DE) | 2005-02-10 | — | — | WO | disclosed |
| WO-2005012308-A1 | NOVEL CYANOPYRROLIDIDES, METHODS FOR THE PRODUCTION THEREOF, AND USE OF THE SAME AS MEDICAMENTS | SANOFI-AVENTIS DEUTSCHLAND GMBH (DE) | 2005-02-10 | — | — | WO | disclosed |
| US-4357078-A | ELECTROOPTICS; DISPLAYING | THE SECRETARY OF STATE FOR DEFENCE IN HER BRITANNIC MAJESTY'S GOVERNMENT OF THE UNITED KINGDOM OF GREAT BRITAIN AND NORTHERN IRELAND (GB) | 1982-11-02 | — | — | US | disclosed |
| US-4231915-A | HEAT RESISTANCE, DIELECTRICS, GOOD GELLING AND TENSILE STRENGTH | CHEMISCHE WERKE HULS AKTIENGESELLSCHAFT (DE) | 1980-11-04 | — | — | US | disclosed |
| US-4024278-A | Mite control using alkyl esters of alkynyl acids | ZOECON CORPORATION (US) | 1977-05-17 | — | — | US | disclosed |
| US-3996380-A | Alkynyl esters for controlling mites | ZOECON CORPORATION (US) | 1976-12-07 | — | — | US | disclosed |