⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19018658 | 0.97 | NPC1 (0.44) | — | |
| SCHEMBL5150085 | 0.97 | NPC1 (0.44) | — | |
| SCHEMBL996780 | 0.97 | NPC1 (0.44) | — | |
| SCHEMBL566591 | 0.97 | NPC1 (0.44) | — | |
| Ammonia Solution, Strong SCHEMBL8076868 | 0.97 | — | — | |
| SCHEMBL9129037 | 0.97 | NPC1 (0.44) | — | |
| SCHEMBL60435 | 0.97 | — | — | |
| Charcoal, Activated SCHEMBL12484130 | 0.94 | NPC1 (0.43) | — | |
| Ammonia Solution, Strong SCHEMBL8076640 | 0.94 | NPC1 (0.43) | — | |
| Ammonia Solution, Strong SCHEMBL8078526 | 0.94 | NPC1 (0.43) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1396 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12631966-B2 | Method for forming photoresist patterns | SAMSUNG SDI CO., LTD. (KR) | 2026-05-19 | — | — | US | claimed |
| US-12590221-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-03-31 | — | — | US | claimed |
| US-12554199-B2 | Resist topcoat composition, and method of forming patterns using the composition | SAMSUNG SDI CO., LTD. (KR) | 2026-02-17 | — | — | US | claimed |
| EP-4648871-A2 | PROCESS FOR PURIFICATION OF CHEMICAL COMPONENTS FROM PLANT MATTER | KB CRASH CREATIONS LLC (US) | 2025-11-19 | — | — | EP | claimed |
| WO-2025066075-A1 | ELECTROLYTE AND ALKALI METAL SECONDARY BATTERY CONTAINING SAME | 中国科学院苏州纳米技术与纳米仿生研究所 | 2025-04-03 | — | — | WO | claimed |
| CN-119695283-A | Electrolyte and alkali metal secondary battery containing same | 中国科学院苏州纳米技术与纳米仿生研究所 | 2025-03-25 | — | — | CN | claimed |
| WO-2024151548-A2 | PROCESS FOR PURIFICATION OF CHEMICAL COMPONENTS FROM PLANT MATTER | KB CRASH CREATINS LLC (US) | 2024-07-18 | — | — | WO | claimed |
| US-20240228492-A1 | Process For Purification of Chemical Components From Plant Matter | KB Crash Creations LLC (US) | 2024-07-11 | — | — | US | claimed |
| CN-117013085-A | Weak solvation electrolyte and lithium-sulfur battery and lithium ion battery containing same | 中国科学院苏州纳米技术与纳米仿生研究所 | 2023-11-07 | — | — | CN | claimed |
| US-20230026579-A1 | METHOD FOR FORMING PHOTORESIST PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2023-01-26 | — | — | US | claimed |
| US-20070248908-A1 | ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RESOLUTION | INTERNATIONAL BUSINESS MACHINES (US) | 2007-10-25 | — | — | US | claimed |
| US-20050106494-A1 | Silicon-containing resist systems with cyclic ketal protecting groups | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-05-19 | — | — | US | claimed |
| US-20040121399-A1 | Substrate bound linker molecules for the construction of biomolecule microarrays | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-06-24 | — | — | US | claimed |
| US-6369279-B1 | STYRENE WITH ETHER OR FLUORINE GROUPS FOR POLYMERS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-09 | — | — | US | claimed |
| US-6268436-B1 | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-07-31 | — | — | US | claimed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | claimed |
| US-6103447-A | Approach to formulating irradiation sensitive positive resists | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2000-08-15 | — | — | US | claimed |
| US-6043003-A | SOME OF THE POLAR FUNCTIONAL GROUPS OF THE AQUEOUS BASE SOLUBLE POLYMER OR COPOLYMERS ARE PROTECTED WITH A CYCLIC ALIPHATIC KETAL PROTECTING GROUP SUCH AS METHOXYCYCLOHEXANYL. | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-28 | — | — | US | claimed |
| US-6037097-A | A CYCLIC ALIPHATIC KETAL SUBSTITUENT E.G. METHOXYCYCLOHEXANYL AS AN ACID-LABILE PROTECTING GROUP FOR AN AQUEOUS BASE SOLUBLE POLYMER, E.G. A POLYHYDROXYSTYRENE; SHELF-LIFE; VACUUM STABILITY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-03-14 | — | — | US | claimed |
| EP-0932082-A2 | Chemically amplified resist composition and method of creating a patterned resist using electron beam | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-07-28 | — | — | EP | claimed |