Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PIK3CA | P42336 | 18/20 | 0.45 |
| ▸ | MTOR | P42345 | 15/20 | 0.45 |
| ▸ | PIK3CD | O00329 | 2/20 | 0.30 |
| ▸ | PIK3CB | P42338 | 2/20 | 0.30 |
| ▸ | PIK3CG | P48736 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2785811 | 0.90 | PIK3CA (0.48) | PIK3CAMTOR | |
| SCHEMBL752419 | 0.89 | MTOR (0.47) | PIK3CAMTOR | |
| SCHEMBL753025 | 0.85 | MTOR (0.50) | PIK3CAMTORPIK3CG | |
| SCHEMBL750591 | 0.84 | MTOR (0.54) | PIK3CAMTORPIK3CDPIK3CBPIK3CG | |
| SCHEMBL754088 | 0.84 | MTOR (0.51) | PIK3CAMTOR | |
| SCHEMBL751459 | 0.83 | PIK3CA (0.42) | PIK3CAMTOR | |
| SCHEMBL754686 | 0.83 | KDM4E (0.44) | PIK3CAMTOR | |
| SCHEMBL2789279 | 0.82 | PIK3CA (0.43) | PIK3CAMTOR | |
| SCHEMBL754238 | 0.81 | MTOR (0.40) | PIK3CAMTOR | |
| SCHEMBL753578 | 0.80 | PIK3CA (0.40) | PIK3CAMTORPIK3CDPIK3CBPIK3CG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118344257-A | Modified cyclohexyl epoxy auxiliary agent for photo-curing solder resist ink and preparation method thereof | 广东炎墨方案科技有限公司 | 2024-07-16 | — | — | CN | claimed |
| CN-117843921-A | Method for preparing high-performance photosensitive solder resist ink based on diamine chain extension modified bisphenol epoxy resin | 广东炎墨方案科技有限公司 | 2024-04-09 | — | — | CN | claimed |
| CN-116768728-A | Method for preparing high-performance photosensitive solder resist ink from naphthalene type chain extension modified epoxy resin | 广东炎墨方案科技有限公司 | 2023-09-19 | — | — | CN | claimed |
| CN-115386927-A | Method for plating rhodium and ruthenium on surface of copper material | 惠州市安泰普表面处理科技有限公司 | 2022-11-25 | — | — | CN | claimed |
| CN-109776494-B | Multi-target antitumor activity nicotinamide phosphoribosyltransferase nitrogen mustard inhibitor and preparation and application thereof | 中国人民解放军第二军医大学 | 2021-06-18 | — | — | CN | claimed |
| CN-109437643-B | Method for preparing gel reducing agent from amphoteric polyester polycarboxylic acid compound | 湖北工业大学 | 2021-03-02 | — | — | CN | claimed |
| EP-2430013-B1 | HETEROARYL COMPOUNDS AS PIKK INHIBITORS | AMGEN INC (US) | 2014-10-15 | — | — | EP | claimed |
| US-20120190666-A1 | Heteroaryl Compounds as PIKK Inhibitors | AMGEN INC. (US) | 2012-07-26 | — | — | US | claimed |
| EP-2430013-A1 | HETEROARYL COMPOUNDS AS PIKK INHIBITORS | Amgen, Inc (US) | 2012-03-21 | — | — | EP | claimed |
| WO-2010132598-A1 | HETEROARYL COMPOUNDS AS PIKK INHIBITORS | AMGEN INC. (US) | 2010-11-18 | — | — | WO | claimed |
| CN-1214990-C | Palladium complex salt and use thereof for adjusting palladium concentration of electrolytic solution for deposit of palladium or its alloys | FRANCE METALE SCIENCE & TECHNO (FR) | 2005-08-17 | — | — | CN | claimed |
| CN-1190522-C | Electrolytic solution for electrochemical deposit of palladium or its alloys | FRANCE METALE SCIENCE & TECHNO (FR) | 2005-02-23 | — | — | CN | claimed |
| CN-1430683-A | Electrolyte for electrochemical deposition of palladium or its alloy | FRANCE METALE SCIENCE & TECHNO (FR) | 2003-07-16 | — | — | CN | claimed |
| CN-1430579-A | Palladium complex salt and use thereof for adjusting palladium concentration of electrolytic solution for deposit of palladium or its alloys | FRANCE METALE SCIENCE & TECHNO (FR) | 2003-07-16 | — | — | CN | claimed |
| EP-0246869-B1 | GOLD ELECTROPLATING BATH | ENGELHARD CORPORATION (US) | 1991-10-23 | — | — | EP | claimed |
| US-4767507-A | 3-(3-PYRIDYL) ACRYLIC ACID AND 3-(3-QUINOLYL) ACRYLIC ACID ADDITIVES; CORROSION AND WEAR RESISTANCE | ENGELHARD CORPORATION (US) | 1988-08-30 | — | — | US | claimed |
| EP-0246869-A1 | Gold electroplating bath | ENGELHARD CORPORATION (US) | 1987-11-25 | — | — | EP | claimed |
| CN-118344257-A | Modified cyclohexyl epoxy auxiliary agent for photo-curing solder resist ink and preparation method thereof | 广东炎墨方案科技有限公司 | 2024-07-16 | — | — | CN | disclosed |
| EP-0246869-A1 | Gold electroplating bath | ENGELHARD CORPORATION (US) | 1987-11-25 | — | — | EP | disclosed |
| EP-0246869-A1 | Gold electroplating bath | ENGELHARD CORPORATION (US) | 1987-11-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120190666-A1 | Heteroaryl Compounds as PIKK Inhibitors | PIK3CA, PIKFYVE, PIK3CD | PIK3CA 1/4885MTOR 21/4885PIK3CD 3/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.