⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfurous Acid SCHEMBL42081 | 0.94 | — | — | |
| Sulfurous Acid SCHEMBL4915909 | 0.94 | — | — | |
| Sulfurous Acid SCHEMBL11223179 | 0.88 | — | — | |
| Sulfurous Acid SCHEMBL11233785 | 0.88 | — | — | |
| Sulfurous Acid SCHEMBL11223589 | 0.88 | — | — | |
| Sulfurous Acid SCHEMBL11326612 | 0.88 | — | — | |
| Sulfurous Acid SCHEMBL11234511 | 0.88 | — | — | |
| Sulfurous Acid SCHEMBL11233466 | 0.88 | — | — | |
| Sulfurous Acid SCHEMBL23070 | 0.88 | — | — | |
| Sulfurous Acid SCHEMBL2127501 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2960228-B1 | METHOD FOR PRODUCING METHACRYLIC ACID ESTER | SUMITOMO CHEMICAL CO (JP) | 2018-09-12 | — | — | EP | disclosed |
| US-9682915-B2 | Method for producing methacrylic acid ester | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-20 | — | — | US | disclosed |
| US-20160039738-A1 | METHOD FOR PRODUCING METHACRYLIC ACID ESTER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-11 | — | — | US | disclosed |
| EP-2960228-A1 | METHOD FOR PRODUCING METHACRYLIC ACID ESTER | Sumitomo Chemical Co., Ltd (JP) | 2015-12-30 | — | — | EP | disclosed |
| US-6472079-B2 | PRODUCT OF HYDROLYSIS AND CONDENSATION OF AN ORGANOSILICON COMPOUND; 1A OR 2A COMPOUND, ESPECIALLY CARBOXYLIC SALT; SOLVENT; EXCELLENT CRACKING RESISTANCE AFTER A PCT (PRESSURE COOKER TEST). | JSR CORPORATION (JP) | 2002-10-29 | — | — | US | disclosed |
| US-20020045693-A1 | Composition for film formation, method of film formation and silica-based film | JSR CORPORATION (JP) | 2002-04-18 | — | — | US | disclosed |
| EP-1148105-A2 | Composition for film formation, method of film formation, and silica-based film | JSR Corporation (JP) | 2001-10-24 | — | — | EP | disclosed |