SCHEMBL7521863

SCHEMBL7521863

Nc1ccc(/C=C/c2ccc(N)c(C(=O)O)c2)cc1C(=O)O

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.61
KDM4E B2RXH2 2/20 0.61
GFER P55789 1/20 0.61
RXFP1 Q9HBX9 1/20 0.61
PTPN1 P18031 5/20 0.60
PTPN2 P17706 2/20 0.60
PTPN6 P29350 2/20 0.60
MAPT P10636 2/20 0.59
MEN1 O00255 1/20 0.59
USP2 O75604 1/20 0.59
POLB P06746 1/20 0.59
THRB P10828 1/20 0.59
PKM P14618 1/20 0.59
APEX1 P27695 1/20 0.59
RECQL P46063 1/20 0.59
BLM P54132 1/20 0.59
MCL1 Q07820 1/20 0.59
TDP1 Q9NUW8 1/20 0.59
GLA P06280 1/20 0.57
KEAP1 Q14145 1/20 0.57

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7652882 1.00 KMT2A (0.61) KMT2AKDM4EGFERRXFP1PTPN1
SCHEMBL23143213 0.93 PTPN1 (0.67) KMT2AKDM4EGFERRXFP1PTPN1
SCHEMBL27556922 0.86 KDM4E (0.59) KMT2AKDM4EGFERRXFP1PTPN1
SCHEMBL17066788 0.84 KDM4E (0.58) KMT2AKDM4EGFERRXFP1PTPN1
SCHEMBL13083829 0.84 KMT2A (0.57) KMT2AKDM4EGFERRXFP1PTPN1
SCHEMBL29393716 0.83 PTPN1 (0.55) KMT2AKDM4EGFERRXFP1PTPN1
SCHEMBL9175452 0.80 PTPN1 (0.67) PTPN1PTPN2PTPN6ALDH1A1CDC25B
SCHEMBL15330144 0.76 KMT2A (0.72) KMT2AKDM4EGFERRXFP1MAPT
SCHEMBL29953670 0.76 KMT2A (0.72) KMT2AKDM4EGFERRXFP1MAPT
SCHEMBL29498389 0.76 KMT2A (1.00) KMT2AKDM4EGFERRXFP1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0606013-B1 Polymer scale preventive agent SHINETSU CHEMICAL CO (JP) 1997-10-22 EP claimed
US-5424377-A Process to prevent scale adhesion using condensation product of aromatic amine and a quinone SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-06-13 US claimed
EP-0606013-A1 Polymer scale preventive agent Shin-Etsu Chemical Co., Ltd. (JP) 1994-07-13 EP claimed
US-6485527-B1 Use of reactive dyes for dyeing hair BASF AKTIENGESELLSCHAFT (DE) 2002-11-26 US disclosed
EP-0929610-B1 REACTIVE DYES WITH A HETEROCYCLIC ANCHOR DYSTAR TEXTILFARBEN GMBH & CO (DE) 2002-08-28 EP disclosed
EP-1027387-B1 DOUBLE REACTIVE DYES DYSTAR TEXTILFARBEN GMBH & CO (DE) 2002-02-06 EP disclosed
US-6197941-B1 TRIAZINE, METALLIZED, AZO, ANTHRAQUINONE, FORMAZAN, PHTHALOCYANINE, AND DIOXAZINE DYES BASF AKTIENGESELLSCHAFT (DE) 2001-03-06 US disclosed
US-6159250-A Doubled reactive dyes BASF AKTIENGESELLSCHAFT (DE) 2000-12-12 US disclosed
EP-0606013-B1 Polymer scale preventive agent SHINETSU CHEMICAL CO (JP) 1997-10-22 EP disclosed
US-5424377-A Process to prevent scale adhesion using condensation product of aromatic amine and a quinone SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-06-13 US disclosed
EP-0606013-A1 Polymer scale preventive agent Shin-Etsu Chemical Co., Ltd. (JP) 1994-07-13 EP disclosed
US-5241055-A Use in cold pad-batch processing; fixing; fiber bonding; color- and washfastness; monoazo-, disazo-formazan, triphenyldioxazine and metal phthalocyanine dyes BASF AKTIENGESELLSCHAFT (DE) 1993-08-31 US disclosed
US-5003049-A Fiber-Reactive Dyes for Hydroxy Textiles BASF AKTIENGESELLSCHAFT (DE) 1991-03-26 US disclosed
US-4677199-A Reactive dyes containing substituted 4-fluoropyridaz-6-one radicals BASF AKTIENGESELLSCHAFT (DE) 1987-06-30 US disclosed
EP-0119441-B1 REACTIVE DYES WITH SUBSTITUTED 4-FLUOROPYRIDAZ-6-ONE GROUPS BASF Aktiengesellschaft (DE) 1987-02-25 EP disclosed
EP-0133270-A1 Reactive dyes BASF Aktiengesellschaft (DE) 1985-02-20 EP disclosed
EP-0119441-A2 Reactive dyes with substituted 4-fluoropyridaz-6-one groups BASF Aktiengesellschaft (DE) 1984-09-26 EP disclosed
US-4254215-A Process for the prevention of darkening and the formation of a sediment in photographic developer solutions CIBA-GEIGY AG (CH) 1981-03-03 US disclosed
US-4141734-A SUBSTITUTED ORGANIC DI- OR TRISULFIDE ANTIDEPOSIT AGENTS CIBA-GEIBY AG (CH) 1979-02-27 US disclosed